| 6534243 |
Chemical feature doubling process |
Michael K. Templeton, Ramkumar Subramanian, Bharath Rangarajan, Ursula Q. Quinto |
2003-03-18 |
| 6455888 |
Memory cell structure for elimination of oxynitride (ONO) etch residue and polysilicon stringers |
Michael K. Templeton, Nicholas H. Tripsas, Maria C. Chan |
2002-09-24 |
| 6423475 |
Sidewall formation for sidewall patterning of sub 100 nm structures |
Christopher F. Lyons, Michael K. Templeton |
2002-07-23 |
| 6352930 |
Bilayer anti-reflective coating and etch hard mask |
Suzette K. Pangrle, Maria C. Chan, Lewis Shen |
2002-03-05 |
| 6350559 |
Method for creating thinner resist coating that also has fewer pinholes |
Michael K. Templeton, Christopher F. Lyons |
2002-02-26 |
| 6316804 |
Oxygen implant self-aligned, floating gate and isolation structure |
Michael K. Templeton |
2001-11-13 |
| 6291137 |
Sidewall formation for sidewall patterning of sub 100 nm structures |
Christopher F. Lyons, Michael K. Templeton |
2001-09-18 |
| 6269322 |
System and method for wafer alignment which mitigates effects of reticle rotation and magnification on overlay |
Michael K. Templeton, Bharath Rangarajan, Terry Manchester |
2001-07-31 |
| 6232002 |
Bilayer anti-reflective coating and etch hard mask |
Suzette K. Pangrle, Maria C. Chan, Lewis Shen |
2001-05-15 |
| 6221768 |
Use of implanted ions to reduce oxide-nitride-oxide (ONO) etch residue and polystringers |
— |
2001-04-24 |
| 6214737 |
Simplified sidewall formation for sidewall patterning of sub 100 nm structures |
Christopher F. Lyons, Michael K. Templeton |
2001-04-10 |
| 6197455 |
Lithographic mask repair using a scanning tunneling microscope |
Sanjay K. Yedur, Bharath Rangarajan, Bhanwar Singh, Michael K. Templeton |
2001-03-06 |
| 6136510 |
Doubled-sided wafer scrubbing for improved photolithography |
Tho Le La, Subramanian Venkatkrishnan, Mark T. Ramsbey, Jack F. Thomas |
2000-10-24 |
| 6117597 |
Extreme ultraviolet lithography mask blank and manufacturing method therefor |
— |
2000-09-12 |
| 6110833 |
Elimination of oxynitride (ONO) etch residue and polysilicon stringers through isolation of floating gates on adjacent bitlines by polysilicon oxidation |
Michael K. Templeton, Nicholas H. Tripsas, Maria C. Chan |
2000-08-29 |
| 6094335 |
Vertical parallel plate capacitor |
— |
2000-07-25 |
| 6066530 |
Oxygen implant self-aligned, floating gate and isolation structure |
Michael K. Templeton |
2000-05-23 |
| 6043120 |
Elimination of oxynitride (ONO) etch residue and polysilicon stringers through isolation of floating gates on adjacent bitlines by polysilicon oxidation |
Michael K. Templeton, Nicholas H. Tripsas, Maria C. Chan |
2000-03-28 |
| 6030868 |
Elimination of oxynitride (ONO) etch residue and polysilicon stringers through isolation of floating gates on adjacent bitlines by polysilicon oxidation |
Michael K. Templeton, Nicholas H. Tripsas, Maria C. Chan, Mark T. Ramsbey |
2000-02-29 |
| 5978441 |
Extreme ultraviolet lithography mask blank and manufacturing method therefor |
— |
1999-11-02 |
| 5939750 |
Use of implanted ions to reduce oxide-nitride-oxide (ONO) etch residue and polystringers |
— |
1999-08-17 |
| 5780204 |
Backside wafer polishing for improved photolithography |
Tho Le La, Subramanian Venkatkrishnan, Mark T. Ramsbey, Jack F. Thomas |
1998-07-14 |
| 5356662 |
Method for repairing an optical element which includes a multilayer coating |
Donald M. Tennant, Warren K. Waskiewicz, David L. Windt |
1994-10-18 |
| 5265143 |
X-ray optical element including a multilayer coating |
Richard E. Howard, Donald M. Tennant, Warren K. Waskiewicz, David L. Windt |
1993-11-23 |