| 11857997 |
Metal surface protection |
Ali Afzali-Ardakani, David L. Rath, Sarunya Bangsaruntip |
2024-01-02 |
| 11024512 |
Selective etch formulation for silicon oxide |
Ali Afzali-Ardakani, Benjamin Wymore, David L. Rath |
2021-06-01 |
| 10276384 |
Plasma shallow doping and wet removal of depth control cap |
Robert L. Bruce, Kevin K. Chan, Sebastian U. Engelmann, Dario L. Goldfarb, Marinus Hopstaken +3 more |
2019-04-30 |
| 10167443 |
Wet clean process for removing CxHyFz etch residue |
Robert L. Bruce, Sebastian U. Engelmann, Eric A. Joseph, Mahmoud Khojasteh, Masahiro Nakamura +3 more |
2019-01-01 |
| 9536731 |
Wet clean process for removing CxHyFz etch residue |
Robert L. Bruce, Sebastian U. Engelmann, Eric A. Joseph, Mahmoud Khojasteh, Masahiro Nakamura +3 more |
2017-01-03 |
| 9416338 |
Composition for and method of suppressing titanium nitride corrosion |
Emanuel I. Cooper, Makonnen Payne |
2016-08-16 |
| 8865017 |
Silicon surface texturing method for reducing surface reflectance |
Mahadevaiyer Krishnan, Jun Liu, Satyavolu S. Papa Rao |
2014-10-21 |
| 8637405 |
Silicon surface texturing method for reducing surface reflectance |
Mahadevaiyer Krishnan, Jun Liu, Satyavolu S. Papa Rao |
2014-01-28 |
| 8618036 |
Aqueous cerium-containing solution having an extended bath lifetime for removing mask material |
Ali Afzali-Ardakani, John A. Fitzsimmons, Nicholas C. M. Fuller, Mahmoud Khojasteh, Jennifer V. Muncy +4 more |
2013-12-31 |
| 8563408 |
Spin-on formulation and method for stripping an ion implanted photoresist |
Ali Afzali-Ardakani, Mahmoud Khojasteh, Ronald W. Nunes |
2013-10-22 |
| 8455366 |
Use of an organic planarizing mask for cutting a plurality of gate lines |
Nicholas C. M. Fuller, Pratik P. Joshi, Mahmoud Khojasteh, Rajiv Ranade |
2013-06-04 |
| 8455420 |
Spin-on formulation and method for stripping an ion implanted photoresist |
Ali Afzali-Ardakani, Mahmoud Khojasteh, Ronald W. Nunes |
2013-06-04 |
| 8440494 |
Single-crystalline silicon alkaline texturing with glycerol or ethylene glycol additives |
Kathryn C. Fisher, Jun Liu, Satyavolu S. Papa Rao, James Vichiconti |
2013-05-14 |
| 8367556 |
Use of an organic planarizing mask for cutting a plurality of gate lines |
Nicholas C. M. Fuller, Pratik P. Joshi, Mahmoud Khojasteh, Rajiv Ranade |
2013-02-05 |
| 8367555 |
Removal of masking material |
Ali Afzali-Ardakani, Emanuel I. Cooper, Mahmoud Khojasteh, Ronald W. Nunes |
2013-02-05 |
| 8252673 |
Spin-on formulation and method for stripping an ion implanted photoresist |
Ali Afzali-Ardakani, Mahmoud Khojasteh, Ronald W. Nunes |
2012-08-28 |
| 8178382 |
Suspended germanium photodetector for silicon waveguide |
Solomon Assefa, Jack O. Chu, Martin M. Frank, William M. Green, Young-Hee Kim +3 more |
2012-05-15 |
| 8026200 |
Low pH mixtures for the removal of high density implanted resist |
Emanuel I. Cooper, Julie Cissell, Renjie Zhou, Michael B. Korzenski, Mahmoud Khojasteh |
2011-09-27 |
| 7902620 |
Suspended germanium photodetector for silicon waveguide |
Solomon Assefa, Jack O. Chu, Martin M. Frank, William M. Green, Young-Hee Kim +3 more |
2011-03-08 |
| 7501345 |
Selective silicide formation by electrodeposit displacement reaction |
Veeraraghaven S. Basker, Hariklia Deligianni, Balasubramanian S. Pranatharthi Haran, James J. Kelly, Christian Lavoie |
2009-03-10 |
