| 10832923 |
Lower plasma-exclusion-zone rings for a bevel etcher |
Tong Fang, Yunsang Kim, Keechan Kim |
2020-11-10 |
| 10811282 |
Upper plasma-exclusion-zone rings for a bevel etcher |
Tong Fang, Yunsang Kim, Keechan Kim |
2020-10-20 |
| 10629458 |
Control of bevel etch film profile using plasma exclusion zone rings larger than the wafer diameter |
Tong Fang, Yunsang Kim, Keechan Kim |
2020-04-21 |
| 8398778 |
Control of bevel etch film profile using plasma exclusion zone rings larger than the wafer diameter |
Tong Fang, Yunsang Kim, Keechan Kim |
2013-03-19 |
| 8349202 |
Methods for controlling bevel edge etching in a plasma chamber |
Tong Fang, Yunsang Kim, Andrew D. Bailey, III, Olivier Rigoutat |
2013-01-08 |
| 8083890 |
Gas modulation to control edge exclusion in a bevel edge etching plasma chamber |
Tong Fang, Yunsang Kim, Andrew D. Bailey, III, Olivier Rigoutat |
2011-12-27 |
| 7316785 |
Methods and apparatus for the optimization of etch resistance in a plasma processing system |
Yoko Y. Adams, Alan J. Miller |
2008-01-08 |
| 7097777 |
Magnetic switching device |
Gregory Costrini, John P. Hummel, Kia-Seng Low |
2006-08-29 |
| 7015049 |
Fence-free etching of iridium barrier having a steep taper angle |
Ulrich Egger, Haoren Zhuang, Kazuhiro Tomioka |
2006-03-21 |
| 6984529 |
Fabrication process for a magnetic tunnel junction device |
Young Hoon Lee, Rajiv Ranade, Ihar Kasko, Joachim Neutzel, Keith Milkove +1 more |
2006-01-10 |
| 6815248 |
Material combinations for tunnel junction cap layer, tunnel junction hard mask and tunnel junction stack seed layer in MRAM processing |
Rainer Leuschner, Xian J. Ning |
2004-11-09 |
| 6815364 |
Tungsten hard mask |
Matthias Lipinski |
2004-11-09 |
| 6184134 |
Dry process for cleaning residues/polymers after metal etch |
Nirmal Chaudhary, Xian J. Ning |
2001-02-06 |
