XN

Xian J. Ning

S( Semiconductor Manufacturing International (Shanghai): 17 patents #20 of 1,122Top 2%
Infineon Technologies Ag: 16 patents #596 of 7,486Top 8%
SA Siemens Aktiengesellschaft: 3 patents #4,667 of 22,248Top 25%
IBM: 3 patents #26,272 of 70,183Top 40%
S( Semiconductor Manufacturing International (Beijing): 1 patents #301 of 689Top 45%
UM United Microelectronics: 1 patents #2,686 of 4,560Top 60%
📍 Potsdam, NY: #6 of 231 inventorsTop 3%
🗺 New York: #2,966 of 115,490 inventorsTop 3%
Overall (All Time): #90,766 of 4,157,543Top 3%
37
Patents All Time

Issued Patents All Time

Showing 1–25 of 37 patents

Patent #TitleCo-InventorsDate
8395240 Bond pad for low K dielectric materials and method for manufacture for semiconductor devices 2013-03-12
8392863 Method for circuit layout and rapid thermal annealing method for semiconductor apparatus Jianhua Ju 2013-03-05
8158520 Method of forming a via structure dual damascene structure for the manufacture of semiconductor integrated circuit devices 2012-04-17
8106423 Method and structure using a pure silicon dioxide hardmask for gate patterning for strained silicon MOS transistors Hanming Wu, Jiang Zhang, John Chen 2012-01-31
8058120 Integration scheme for strained source/drain CMOS using oxide hard mask Bei Zhu 2011-11-15
8049308 Bond pad for low K dielectric materials and method for manufacture for semiconductor devices 2011-11-01
7820500 Single mask scheme method and structure for integrating PMOS and NMOS transistors using strained silicon 2010-10-26
7709336 Metal hard mask method and structure for strained silicon MOS transistors Hanming Wu, John Chen 2010-05-04
7663159 Seal ring corner design 2010-02-16
7605470 Dummy patterns and method of manufacture for mechanical strength of low K dielectric materials in copper interconnect structures for semiconductor devices 2009-10-20
7591659 Method and structure for second spacer formation for strained silicon MOS transistors John Chen, Hanming Wu 2009-09-22
7547595 Integration scheme method and structure for transistors using strained silicon 2009-06-16
7479699 Seal ring structures with unlanded via stacks 2009-01-20
7425488 Method and structure using a pure silicon dioxide hardmask for gate patterning for strained silicon MOS transistors Hanming Wu, Jiang Zhang, John Chen 2008-09-16
7335566 Polysilicon gate doping method and structure for strained silicon MOS transistors Bei Zhu 2008-02-26
7015110 Method and structure of manufacturing high capacitance metal on insulator capacitors in copper 2006-03-21
6979526 Lithography alignment and overlay measurement marks formed by resist mask blocking for MRAMs 2005-12-27
6972251 Method for fabricating copper damascene structures in porous dielectric materials 2005-12-06
6960365 Vertical MIMCap manufacturing method 2005-11-01
6815248 Material combinations for tunnel junction cap layer, tunnel junction hard mask and tunnel junction stack seed layer in MRAM processing Rainer Leuschner, George Stojakovic 2004-11-09
6794262 MIM capacitor structures and fabrication methods in dual-damascene structures Keith Kwong Hon Wong 2004-09-21
6780775 Design of lithography alignment and overlay measurement marks on CMP finished damascene surface 2004-08-24
6750115 Method for generating alignment marks for manufacturing MIM capacitors Keith Kwong Hon Wong 2004-06-15
6723600 Method for making a metal-insulator-metal capacitor using plate-through mask techniques Kwong Hon Wong 2004-04-20
6713395 Single RIE process for MIMcap top and bottom plates 2004-03-30