Issued Patents All Time
Showing 1–25 of 29 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 8758962 | Method and apparatus for sub-pellicle defect reduction on photomasks | Jay Burnham, Louis M. Kindt | 2014-06-24 |
| 8759415 | Aromatic vinyl ether based reverse-tone step and flash imprint lithography | Richard Anthony DiPietro, Mark Whitney Hart, Hiroshi Ito | 2014-06-24 |
| 8637602 | Stabilization of vinyl ether materials | Hiroshi Ito | 2014-01-28 |
| 8262961 | Aromatic vinyl ether based reverse-tone step and flash imprint lithography | Richard Anthony DiPietro, Mark Whitney Hart, Hiroshi Ito | 2012-09-11 |
| 8173331 | Method and apparatus for sub-pellicle defect reduction on photomasks | Jay Burnham, Louis M. Kindt | 2012-05-08 |
| 8168691 | Vinyl ether resist formulations for imprint lithography and processes of use | Taiichi Furukawa | 2012-05-01 |
| 8168109 | Stabilizers for vinyl ether resist formulations for imprint lithography | Sally A. Swanson, Taiichi Furukawa | 2012-05-01 |
| 8128832 | Processes and materials for step and flash imprint lithography | Richard Anthony DiPietro, Mark Whitney Hart, Hiroshi Ito | 2012-03-06 |
| 8114331 | Amorphous oxide release layers for imprint lithography, and method of use | Simone Raoux | 2012-02-14 |
| 8029716 | Amorphous nitride release layers for imprint lithography, and method of use | Christopher V. Jahnes, Simone Raoux, Stephen M. Rossnagel | 2011-10-04 |
| 7875873 | Phase change materials and associated memory devices | Yi-Chou Chen, Simone Raoux, Charles Thomas Rettner, Alejandro G. Schrott | 2011-01-25 |
| 7749422 | Release layer for imprinted photocationic curable resins | Robert David Allen, Mark Whitney Hart, Hiroshi Ito | 2010-07-06 |
| 7501648 | Phase change materials and associated memory devices | Yi-Chou Chen, Simone Raoux, Charles Thomas Rettner, Alejandro G. Schrott | 2009-03-10 |
| 7488771 | Stabilization of vinyl ether materials | Hiroshi Ito | 2009-02-10 |
| 7419611 | Processes and materials for step and flash imprint lithography | Richard Anthony DiPietro, Mark Whitney Hart, Hiroshi Ito | 2008-09-02 |
| 7179571 | Apparatus for characterization of photoresist resolution, and method of use | William D. Hinsberg, John A. Hoffnagle, Martha I. Sanchez | 2007-02-20 |
| 7090963 | Process for forming features of 50 nm or less half-pitch with chemically amplified resist imaging | David R. Medeiros, Wu-Song Huang, Gregory Michael Wallraff, Bill Hinsberg | 2006-08-15 |
| 7079223 | Fast model-based optical proximity correction | Alan E. Rosenbluth, Gregg M. Gallatin, Ronald Gordon, Nakgeuon Seong, Alexey Y. Lvov +3 more | 2006-07-18 |
| 7046342 | Apparatus for characterization of photoresist resolution, and method of use | William D. Hinsberg, John A. Hoffnagle, Martha I. Sanchez | 2006-05-16 |
| 6770419 | Low silicon-outgassing resist for bilayer lithography | Mahmoud Khojasteh, Ranee W. Kwong, Kuang-Jung Chen, Pushkara R. Varanasi, Robert David Allen +2 more | 2004-08-03 |
| 6188550 | Self-longitudinally biased magnetoresistive read transducer | Robert E. Fontana, Jr., Ching Hwa Tsang | 2001-02-13 |
| 5826065 | Software architecture for stochastic simulation of non-homogeneous systems | William D. Hinsberg | 1998-10-20 |
| 5745385 | Method for stochastic and deterministic timebase control in stochastic simulations | William D. Hinsberg | 1998-04-28 |
| 5625579 | Stochastic simulation method for processes containing equilibrium steps | William D. Hinsberg | 1997-04-29 |
| 5582860 | Method for producing thin film magnetic structure | Robert E. Fontana, Jr., Ching Hwa Tsang | 1996-12-10 |