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Imaging overlay targets using moiré elements and rotational symmetry arrangements |
Yoel Feler, Mark Ghinovker, Diana Shaphirov, Vladimir Levinski |
2024-10-01 |
| 12013634 |
Reduction or elimination of pattern placement error in metrology measurements |
Yoel Feler, Vladimir Levinski, Roel Gronheid, Sharon Aharon, Anna Golotsvan +1 more |
2024-06-18 |
| 11862522 |
Accuracy improvements in optical metrology |
Barak Bringoltz, Ido Adam, Yoel Feler, Dror Alumot, Yuval Lamhot +6 more |
2024-01-02 |
| 11537043 |
Reduction or elimination of pattern placement error in metrology measurements |
Yoel Feler, Vladimir Levinski, Roel Gronheid, Sharon Aharon, Anna Golotsvan +1 more |
2022-12-27 |
| 11256177 |
Imaging overlay targets using Moiré elements and rotational symmetry arrangements |
Yoel Feler, Mark Ghinovker, Diana Shaphirov, Vladimir Levinski |
2022-02-22 |
| 11164307 |
Misregistration metrology by using fringe Moiré and optical Moiré effects |
Yoel Feler, Mark Ghinovker, Vladimir Levinski, Alexander Svizher |
2021-11-02 |
| 10901325 |
Determining the impacts of stochastic behavior on overlay metrology data |
Michael Adel, Roel Gronheid, Yoel Feler, Vladimir Levinski, Dana Klein +1 more |
2021-01-26 |
| 10831108 |
Method of analyzing and utilizing landscapes to reduce or eliminate inaccuracy in overlay optical metrology |
Tal Marciano, Barak Bringoltz, Ido Adam, Ze'ev Lindenfeld, Zeng Zhao +17 more |
2020-11-10 |