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Optical metrology utilizing short-wave infrared wavelengths |
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Targets for diffraction-based overlay error metrology |
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Overlay mark design for electron beam overlay |
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Overlay mark design for electron beam overlay |
Inna Steely-Tarshish, Stefan Eyring, Mark Ghinovker, Yoel Feler, Ulrich Pohlmann +4 more |
2024-01-02 |
| 11796925 |
Scanning overlay metrology using overlay targets having multiple spatial frequencies |
Yuval Lubashevsky, Itay Gdor, Daria Negri |
2023-10-24 |
| 11726410 |
Multi-resolution overlay metrology targets |
Amnon Manassen, Shlomo Eisenbach, Anna Golotsvan, Yoav Grauer, Eugene Maslovsky |
2023-08-15 |
| 11720031 |
Overlay design for electron beam and scatterometry overlay measurements |
Inna Steely-Tarshish, Stefan Eyring, Mark Ghinovker, Yoel Feler, Ulrich Pohlmann +4 more |
2023-08-08 |
| 11703767 |
Overlay mark design for electron beam overlay |
Inna Steely-Tarshish, Stefan Eyring, Mark Ghinovker, Yoel Feier, Ulrich Pohlmann +4 more |
2023-07-18 |
| 11676909 |
Metrology targets for high topography semiconductor stacks |
Yoav Grauer |
2023-06-13 |
| 10837919 |
Single cell scatterometry overlay targets |
— |
2020-11-17 |
| 10579768 |
Process compatibility improvement by fill factor modulation |
Vladimir Levinski, Tal Itzkovich, Sharon Aharon, Michael Adel, Yuri Paskover +5 more |
2020-03-03 |