Issued Patents All Time
Showing 1–12 of 12 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 11204558 | Particle suppression systems and methods | Yang-Shan Huang, Marco Koert Stavenga | 2021-12-21 |
| 10761435 | Reticle clamping device | Enrico Zordan, Brandon Adam EVANS, Ankur Ramesh BAHETI, Samir Nayfeh | 2020-09-01 |
| 10585359 | Membrane assembly and particle trap | Ronald Peter Albright, Lowell Lane Baker | 2020-03-10 |
| 10423081 | Reticle cooling by non-uniform gas flow | Thomas Venturino, Geoffrey Alan Schultz, Daniel N. Galburt, Santiago E. DELPUERTO, Herman Vogel +3 more | 2019-09-24 |
| 10031428 | Gas flow optimization in reticle stage environment | Koen Cuypers, Marcelo Henrique De Andrade Oliveira, Marinus Jan Remie, Chattarbir Singh, Laurentius Johannes Adrianus Van Bokhoven +9 more | 2018-07-24 |
| 9977351 | Patterning device support, lithographic apparatus, and method of controlling patterning device temperature | Earl William Ebert, Johannes Onvlee, Samir Nayfeh, Mark Josef Schuster, Peter A. Delmastro +5 more | 2018-05-22 |
| 9910368 | Patterning device manipulating system and lithographic apparatuses | Christiaan Louis Valentin, Erik Roelof Loopstra, Christopher Charles Ward, Mark Josef Schuster, Peter James Graffeo | 2018-03-06 |
| 9766557 | Patterning device support, lithographic apparatus, and method of controlling patterning device temperature | Earl William Ebert, Johannes Onvlee, Samir Nayfeh, Mark Josef Schuster, Peter A. Delmastro +5 more | 2017-09-19 |
| 9740112 | Patterning device support and lithographic apparatus | Arindam Sinharoy, Stephen Roux, Jean-Philippe Xavier Van Damme, Mark Josef Schuster, Duncan G. Harris +1 more | 2017-08-22 |
| 9632434 | Reticle cooling system in a lithographic apparatus | Earl William Ebert, Johannes Onvlee, Samir Nayfeh, Mark Josef Schuster, Peter A. Delmastro +6 more | 2017-04-25 |
| 9632433 | Patterning device support, lithographic apparatus, and method of controlling patterning device temperature | Earl William Ebert, Johannes Onvlee, Samir Nayfeh, Mark Josef Schuster, Peter A. Delmastro +5 more | 2017-04-25 |
| 9377700 | Determining position and curvature information directly from a surface of a patterning device | Mark Josef Schuster, Santiago del Puerto, Duncan Walter Bromley, Franciscus Godefridus Casper Bijnen | 2016-06-28 |