| 6806147 |
Method and apparatus for suppressing the channeling effect in high energy deep well implantation |
Bin Yu |
2004-10-19 |
| 6756600 |
Ion implantation with improved ion source life expectancy |
Emi Ishida, Jaime M. Reyes, Jinning Liu, Sandeep Mehta |
2004-06-29 |
| 6642152 |
Method for ultra thin resist linewidth reduction using implantation |
Scott A. Bell, Anne E. Sanderfer, Christopher Lee Pike |
2003-11-04 |
| 6624037 |
XE preamorphizing implantation |
Matthew S. Buynoski |
2003-09-23 |
| 6514833 |
Method of inhibiting lateral diffusion between adjacent wells by introducing carbon or fluorine ions into bottom of STI groove |
Emi Ishida |
2003-02-04 |
| 6503801 |
Non-uniform channel profile via enhanced diffusion |
Richard P. Rouse, Judy Xilin An |
2003-01-07 |
| 6459141 |
Method and apparatus for suppressing the channeling effect in high energy deep well implantation |
Bin Yu |
2002-10-01 |
| 6452198 |
Minimized contamination of semiconductor wafers within an implantation system |
Balaraman Mani, Bill Chen |
2002-09-17 |
| 6445030 |
Flash memory erase speed by fluorine implant or fluorination |
Yider Wu, Jean Y. Yang, Hidehiko Shiraiwa |
2002-09-03 |
| 6380041 |
Semiconductor with laterally non-uniform channel doping profile and manufacturing method therefor |
Geoffrey Choh-Fei Yeap, Ognjen Milic |
2002-04-30 |
| 6288405 |
Method for determining ultra shallow junction dosimetry |
— |
2001-09-11 |
| 6235636 |
Resist removal by polishing |
Matthew S. Buynoski |
2001-05-22 |
| 6232048 |
Method for preparing narrow photoresist lines |
Matthew S. Buynoski, Bhanwar Singh, Shekhan Pramanick, Subhash Gupta |
2001-05-15 |
| 6229177 |
Semiconductor with laterally non-uniform channel doping profile |
Geoffrey Choh-Fei Yeap, Ognjen Milic |
2001-05-08 |
| 6191012 |
Method for forming a shallow junction in a semiconductor device using antimony dimer |
Matthew S. Buynoski |
2001-02-20 |
| 6146944 |
Large angle implantation to prevent field turn-on under select gate transistor field oxide region for non-volatile memory devices |
Yue-Song He, Pau-Ling Chen |
2000-11-14 |
| 6136674 |
Mosfet with gate plug using differential oxide growth |
Judy Xilin An |
2000-10-24 |
| 6087255 |
Conductive layer with anti-reflective surface portion |
Shekhar Pramanick, Bhanwar Singh |
2000-07-11 |
| 6074937 |
End-of-range damage suppression for ultra-shallow junction formation |
Shekhar Pramanick, Emi Ishida |
2000-06-13 |
| 6008098 |
Ultra shallow junction formation using amorphous silicon layer |
Shekhar Pramanick |
1999-12-28 |
| 5940735 |
Reduction of charge loss in nonvolatile memory cells by phosphorus implantation into PECVD nitride/oxynitride films |
Sunil Mehta |
1999-08-17 |
| 5876903 |
Virtual hard mask for etching |
Bhanwar Singh, Shekhar Pramanick, Subash Gupta |
1999-03-02 |
| 5841179 |
Conductive layer with anti-reflective surface portion |
Shekhar Pramanick, Bhanwar Singh |
1998-11-24 |
