| 11348222 |
Methods and systems for inspection of wafers and reticles using designer intent data |
Paul Frank Marella, Sharon McCauley, Ellis Chang, William Volk, James Wiley +2 more |
2022-05-31 |
| 10713771 |
Methods and systems for inspection of wafers and reticles using designer intent data |
Paul Frank Marella, Sharon McCauley, Ellis Chang, William Volk, James Wiley +2 more |
2020-07-14 |
| 10451563 |
Inspection of photomasks by comparing two photomasks |
Weston L. Sousa, Yalin Xiong |
2019-10-22 |
| 10401305 |
Time-varying intensity map generation for reticles |
Rui-fang Shi, Thomas Vavul |
2019-09-03 |
| 9778205 |
Delta die and delta database inspection |
Yanwei Liu, Yalin Xiong |
2017-10-03 |
| 9710903 |
System and method for detecting design and process defects on a wafer using process monitoring features |
Christophe David Fouquet, Zain Saidin, Sergio Edelstein, Savitha Nanjangud |
2017-07-18 |
| 9417191 |
Using reflected and transmission maps to detect reticle degradation |
Rui-fang Shi |
2016-08-16 |
| 9390494 |
Delta die intensity map measurement |
— |
2016-07-12 |
| 9208552 |
Method and system for hybrid reticle inspection |
John D. Miller, Shan Xue, Patrick LoPresti |
2015-12-08 |
| 9002497 |
Methods and systems for inspection of wafers and reticles using designer intent data |
William Volk, James Wiley, Sterling Watson, Sagar A. Kekare, Paul Frank Marella +2 more |
2015-04-07 |
| 8914754 |
Database-driven cell-to-cell reticle inspection |
John D. Miller, Shi Rui-Fang, Chun Guan |
2014-12-16 |
| 8810646 |
Focus offset contamination inspection |
— |
2014-08-19 |
| 8204297 |
Methods and systems for classifying defects detected on a reticle |
Yalin Xiong |
2012-06-19 |
| 8165384 |
Defect classification |
Weimin Ma |
2012-04-24 |
| 8151220 |
Methods for simulating reticle layout data, inspecting reticle layout data, and generating a process for inspecting reticle layout data |
Yalin Xiong |
2012-04-03 |
| 8102408 |
Computer-implemented methods and systems for determining different process windows for a wafer printing process for different reticle designs |
Gaurav Verma, Bo SU, William Volk, Harold Lehon |
2012-01-24 |
| 7995199 |
Method for detection of oversized sub-resolution assist features |
Yalin Xiong |
2011-08-09 |
| 7932004 |
Feature identification for metrological analysis |
Yalin Xiong |
2011-04-26 |
| 7734711 |
Blade server interconnection |
Joseph M. Blecher |
2010-06-08 |
| 7646906 |
Computer-implemented methods for detecting defects in reticle design data |
Zain Saidin, Yalin Xiong, Lance Glasser, Moshe E. Preil |
2010-01-12 |
| 7493590 |
Process window optical proximity correction |
Ruifang Shi, Gaurav Verma |
2009-02-17 |
| 7379847 |
High bandwidth image transfer |
Joseph M. Blecher |
2008-05-27 |