Issued Patents All Time
Showing 25 most recent of 259 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 8547521 | Systems and methods that control liquid temperature in immersion lithography to maintain temperature gradient to reduce turbulence | Srikanteswara Dakshina-Murthy, Ramkumar Subramanian | 2013-10-01 |
| 8124300 | Method of lithographic mask correction using localized transmission adjustment | Luigi Capodieci | 2012-02-28 |
| 8028531 | Mitigating heat in an integrated circuit | Khoi A. Phan, Bharath Rangarajan | 2011-10-04 |
| 8007631 | System and method for imprint lithography to facilitate dual damascene integration with two imprint acts | Srikanteswara Dakshina-Murthy, Ramkumar Subramanian | 2011-08-30 |
| 7875851 | Advanced process control framework using two-dimensional image analysis | Chris Haidinyak, Jason P. Cain | 2011-01-25 |
| 7799514 | Surface treatment with an acidic composition to prevent substrate and environmental contamination | Ramkumar Subramanian, Gilles Amblard | 2010-09-21 |
| 7749662 | Process margin using discrete assist features | Itty Matthew | 2010-07-06 |
| 7709373 | System and method for imprint lithography to facilitate dual damascene integration in a single imprint act | Srikanteswara Dakshina-Murthy, Khoi A. Phan | 2010-05-04 |
| 7604903 | Mask having sidewall absorbers to enable the printing of finer features in nanoprint lithography (1XMASK) | Srikanteswara Dakshina-Murthy, Khoi A. Phan, Bharath Rangarajan, Ramkumar Subramanian | 2009-10-20 |
| 7468296 | Thin film germanium diode with low reverse breakdown | Ercan Adem, Matthew S. Buynoski, Robert J. Chiu, Bryan K. Choo, Calvin T. Gabriel +5 more | 2008-12-23 |
| 7460922 | Scanner optimization for reduced across-chip performance variation through non-contact electrical metrology | Jason P. Cain, Harish K. Bolla, Iraj Emami | 2008-12-02 |
| 7449348 | Feedback control of imprint mask feature profile using scatterometry and spacer etchback | Srikanteswara Dakshina-Murthy, Ramkumar Subramanian, Khoi A. Phan | 2008-11-11 |
| 7405032 | Combination of non-lithographic shrink techniques and trim process for gate formation and line-edge roughness reduction | Gilles Amblard, Srikanteswara Dakshina-Murthy | 2008-07-29 |
| 7386162 | Post fabrication CD modification on imprint lithography mask | Srikanteswara Dakshina-Murthy, Ramkumar Subramanian | 2008-06-10 |
| 7384569 | Imprint lithography mask trimming for imprint mask using etch | Srikanteswara Dakshina-Murthy, Ramkumar Subramanian | 2008-06-10 |
| 7381278 | Using supercritical fluids to clean lenses and monitor defects | Ramkumar Subramanian, Khoi A. Phan, Srikanteswara Dakshina-Murthy | 2008-06-03 |
| 7376259 | Topography compensation of imprint lithography patterning | Srikanteswara Dakshina-Murthy, Ramkumar Subramanian | 2008-05-20 |
| 7373215 | Transistor gate shape metrology using multiple data sources | Jason P. Cain, Iraj Emami | 2008-05-13 |
| 7334202 | Optimizing critical dimension uniformity utilizing a resist bake plate simulator | Qiaolin Zhang, Iraj Emami, Joyce S. Oey Hewett, Luigi Capodiece | 2008-02-19 |
| 7310155 | Extraction of tool independent line-edge-roughness (LER) measurements using in-line programmed LER and reliability structures | Luigi Capodieci, Amit P. Marathe, Ramkumar Subramanian | 2007-12-18 |
| 7309659 | Silicon-containing resist to pattern organic low k-dielectrics | Ramkumar Subramanian, Calvin T. Gabriel | 2007-12-18 |
| 7305645 | Method for manufacturing place & route based on 2-D forbidden patterns | Luigi Capodieci, Ramkumar Subramanian | 2007-12-04 |
| 7295288 | Systems and methods of imprint lithography with adjustable mask | Ramkumar Subramanian, Khoi A. Phan | 2007-11-13 |
| 7289193 | Frame structure for turbulence control in immersion lithography | Ramkumar Subramanian, Khoi A. Phan | 2007-10-30 |
| 7262138 | Organic BARC with adjustable etch rate | Ramkumar Subramanian, Gilles Amblard | 2007-08-28 |