SD

Suman Datta

IN Intel: 177 patents #76 of 30,777Top 1%
PS Penn State: 8 patents #67 of 1,788Top 4%
TL Tata Consultancy Services Limited: 2 patents #494 of 2,089Top 25%
TR Tahoe Research: 1 patents #81 of 215Top 40%
University of California: 1 patents #8,022 of 18,278Top 45%
UL University Of Notre Dame Du Lac: 1 patents #183 of 437Top 45%
📍 Beaverton, OR: #14 of 3,140 inventorsTop 1%
🗺 Oregon: #64 of 28,073 inventorsTop 1%
Overall (All Time): #3,722 of 4,157,543Top 1%
191
Patents All Time

Issued Patents All Time

Showing 126–150 of 191 patents

Patent #TitleCo-InventorsDate
7465976 Tunneling field effect transistor using angled implants for forming asymmetric source/drain regions Jack T. Kavalieros, Matthew V. Metz, Gilbert Dewey, Ben Jin, Justin K. Brask +1 more 2008-12-16
7456476 Nonplanar semiconductor device with partially or fully wrapped around gate electrode and methods of fabrication Scott A. Hareland, Robert S. Chau, Brian S. Doyle, Rafael Rios, Tom Linton 2008-11-25
7456068 Forming ultra-shallow junctions Jack T. Kavalieros, Mark Liu 2008-11-25
7449756 Semiconductor device with a high-k gate dielectric and a metal gate electrode Matthew V. Metz, Mark L. Doczy, Justin K. Brask, Jack T. Kavalieros, Robert S. Chau 2008-11-11
7449373 Method of ion implanting for tri-gate devices Brian S. Doyle, Jack T. Kavalieros, Amlan Majumdar 2008-11-11
7445980 Method and apparatus for improving stability of a 6T CMOS SRAM cell Brian S. Doyle, Robert S. Chau, Jack T. Kavalieros, Bo Zheng, Scott A. Hareland 2008-11-04
7442983 Method for making a semiconductor device having a high-k gate dielectric Mark L. Doczy, Gilbert Dewey, Sangwoo Pae, Justin K. Brask, Jack T. Kavalieros +4 more 2008-10-28
7439113 Forming dual metal complementary metal oxide semiconductor integrated circuits Mark L. Doczy, Mitchell Taylor, Justin K. Brask, Jack T. Kavalieros, Matthew V. Metz +2 more 2008-10-21
7429747 Sb-based CMOS devices Mantu K. Hudait, Jack T. Kavalieros, Mark L. Doczy, Robert S. Chau 2008-09-30
7427541 Carbon nanotube energy well (CNEW) field effect transistor Marko Radosavljevic, Brian S. Doyle, Jack T. Kavalieros, Justin K. Brask, Amlan Majumdar +1 more 2008-09-23
7427794 Tri-gate devices and methods of fabrication Robert S. Chau, Brian S. Doyle, Jack T. Kavalieros, Douglas Barlage, Scott A. Hareland 2008-09-23
7425490 Reducing reactions between polysilicon gate electrodes and high dielectric constant gate dielectrics Jack T. Kavalieros, Justin K. Brask, Mark L. Doczy, Uday Shah, Matthew V. Metz +1 more 2008-09-16
7425500 Uniform silicide metal on epitaxially grown source and drain regions of three-dimensional transistors Matthew V. Metz, Mark L. Doczy, Jack T. Kavalieros, Justin K. Brask, Robert S. Chau 2008-09-16
7407847 Stacked multi-gate transistor design and method of fabrication Brian S. Doyle, Titash Rakshit, Robert S. Chau, Justin K. Brask, Uday Shah 2008-08-05
7402875 Lateral undercut of metal gate in SOI device Justin K. Brask, Jack T. Kavalieros, Brian S. Doyle, Gilbert Dewey, Mark L. Doczy +1 more 2008-07-22
7390947 Forming field effect transistors from conductors Amlan Majumdar, Justin K. Brask, Marko Radosavljevic, Brian S. Doyle, Mark L. Doczy +5 more 2008-06-24
7390709 Method for making a semiconductor device having a high-k gate dielectric layer and a metal gate electrode Mark L. Doczy, Justin K. Brask, Jack T. Kavalieros, Uday Shah, Matthew V. Metz +2 more 2008-06-24
7387927 Reducing oxidation under a high K gate dielectric Robert Turkot, Justin K. Brask, Jack T. Kavalieros, Mark L. Doczy, Matthew V. Metz +2 more 2008-06-17
7384880 Method for making a semiconductor device having a high-k gate dielectric Justin K. Brask, Jack T. Kavalieros, Mark L. Doczy, Matthew V. Metz, Robert S. Chau 2008-06-10
7381608 Method for making a semiconductor device with a high-k gate dielectric and a metal gate electrode Justin K. Brask, Sangwoo Pae, Jack T. Kavalieros, Matthew V. Metz, Mark L. Doczy +2 more 2008-06-03
7358121 Tri-gate devices and methods of fabrication Robert S. Chau, Brian S. Doyle, Jack T. Kavalieros, Douglas Barlage 2008-04-15
7355281 Method for making semiconductor device having a high-k gate dielectric layer and a metal gate electrode Justin K. Brask, Jack T. Kavalieros, Mark L. Doczy, Uday Shah, Chris Barns +3 more 2008-04-08
7355254 Pinning layer for low resistivity N-type source drain ohmic contacts Jack T. Kavalieros, Robert S. Chau, Mark L. Doczy 2008-04-08
7348284 Non-planar pMOS structure with a strained channel region and an integrated strained CMOS flow Brian S. Doyle, Been-Yih Jin, Nancy Zelick, Robert S. Chau 2008-03-25
7342277 Transistor for non volatile memory devices having a carbon nanotube channel and electrically floating quantum dots in its gate dielectric Marko Radosavljevic, Amlan Majumdar, Justin K. Brask, Brian S. Doyle, Robert S. Chau 2008-03-11