CB

Cory Bomberger

IN Intel: 37 patents #961 of 30,777Top 4%
📍 Portland, OR: #504 of 9,213 inventorsTop 6%
🗺 Oregon: #1,029 of 28,073 inventorsTop 4%
Overall (All Time): #87,961 of 4,157,543Top 3%
37
Patents All Time

Issued Patents All Time

Showing 26–37 of 37 patents

Patent #TitleCo-InventorsDate
11450739 Germanium-rich nanowire transistor with relaxed buffer layer Glenn A. Glass, Anand S. Murthy, Tahir Ghani, Jack T. Kavalieros, Siddharth Chouksey +3 more 2022-09-20
11430787 Forming crystalline source/drain contacts on semiconductor devices Karthik Jambunathan, Scott Maddox, Anand S. Murthy 2022-08-30
11404575 Diverse transistor channel materials enabled by thin, inverse-graded, germanium-based layer Karthik Jambunathan, Glenn A. Glass, Anand S. Murthy, Ju H. Nam, Tahir Ghani 2022-08-02
11374100 Source or drain structures with contact etch stop layer Rishabh Mehandru, Anupama Bowonder, Biswajeet Guha, Anand S. Murthy, Tahir Ghani 2022-06-28
11328988 Top gate recessed channel CMOS thin film transistor in the back end of line and methods of fabrication Gilbert Dewey, Ryan Keech, Cheng-Ying Huang, Ashish Agrawal, Willy Rachmady +1 more 2022-05-10
11264501 Device, method and system for promoting channel stress in a NMOS transistor Rishabh Mehandru, Anand S. Murthy, Karthik Jambunathan 2022-03-01
11244943 Three-dimensional integrated circuits (3DICs) including bottom gate MOS transistors with monocrystalline channel material Cheng-Ying Huang, Gilbert Dewey, Ashish Agrawal, Kimin Jun, Willy Rachmady +5 more 2022-02-08
11222977 Source/drain diffusion barrier for germanium NMOS transistors Glenn A. Glass, Anand S. Murthy, Karthik Jambunathan, Tahir Ghani, Jack T. Kavalieros +3 more 2022-01-11
11189730 Non-selective epitaxial source/drain deposition to reduce dopant diffusion for germanium nMOS transistors Glenn A. Glass, Anand S. Murthy, Karthik Jambunathan, Tahir Ghani, Jack T. Kavalieros +3 more 2021-11-30
11164785 Three-dimensional integrated circuits (3DICs) including upper-level transistors with epitaxial source and drain material Ashish Agrawal, Gilbert Dewey, Cheng-Ying Huang, Willy Rachmady, Anand S. Murthy +1 more 2021-11-02
11101356 Doped insulator cap to reduce source/drain diffusion for germanium NMOS transistors Glenn A. Glass, Anand S. Murthy, Karthik Jambunathan, Tahir Ghani, Jack T. Kavalieros +3 more 2021-08-24
11056592 Silicon substrate modification to enable formation of thin, relaxed, germanium-based layer Karthik Jambunathan, Glenn A. Glass, Anand S. Murthy, Ju H. Nam, Tahir Ghani 2021-07-06