CL

Chung-Hsun Lin

IBM: 115 patents #445 of 70,183Top 1%
Globalfoundries: 14 patents #253 of 4,424Top 6%
IN Intel: 14 patents #2,910 of 30,777Top 10%
TE Tessera: 2 patents #162 of 271Top 60%
KT Kabushiki Kaisha Toshiba: 1 patents #13,537 of 21,451Top 65%
NU National Taiwan University: 1 patents #729 of 2,195Top 35%
📍 Portland, OR: #51 of 9,213 inventorsTop 1%
🗺 Oregon: #99 of 28,073 inventorsTop 1%
Overall (All Time): #6,270 of 4,157,543Top 1%
149
Patents All Time

Issued Patents All Time

Showing 76–100 of 149 patents

Patent #TitleCo-InventorsDate
8946853 Diffusion sidewall for a semiconductor structure Dechao Guo, Shu-Jen Han, Ning Su 2015-02-03
8940591 Embedded silicon germanium N-type filed effect transistor for reduced floating body effect Leland Chang, Isaac Lauer, Jeffrey W. Sleight 2015-01-27
8940558 Techniques for quantifying fin-thickness variation in FINFET technology Wilfried Haensch, Philip J. Oldiges, Kern Rim 2015-01-27
8936972 Epitaxially thickened doped or undoped core nanowire FET structure and method for increasing effective device width Sarunya Bangsaruntip, Guy M. Cohen, Jeffrey W. Sleight 2015-01-20
8927397 Diode structure and method for gate all around silicon nanowire technologies Josephine B. Chang, Isaac Lauer, Jeffrey W. Sleight 2015-01-06
8928083 Diode structure and method for FINFET technologies Josephine B. Chang, Isaac Lauer, Jeffrey W. Sleight 2015-01-06
8901655 Diode structure for gate all around silicon nanowire technologies Josephine B. Chang, Isaac Lauer, Jeffrey W. Sleight 2014-12-02
8900934 FinFET devices containing merged epitaxial Fin-containing contact regions Thomas N. Adam, Veeraraghavan S. Basker, Jinghong Li, Sebastian Naczas, Alexander Reznicek +1 more 2014-12-02
8896063 FinFET devices containing merged epitaxial Fin-containing contact regions Thomas N. Adam, Veeraraghavan S. Basker, Jinghong Li, Sebastian Naczas, Alexander Reznicek +1 more 2014-11-25
8895372 Graphene based three-dimensional integrated circuit device Dechao Guo, Shu-Jen Hen, Ning Su 2014-11-25
8877593 Semiconductor device including an asymmetric feature, and method of making the same Josephine B. Chang, Isaac Lauer, Jeffrey Sleight 2014-11-04
8871626 FinFET with vertical silicide structure Veeraraghavan S. Basker, Tenko Yamashita, Chun-Chen Yeh 2014-10-28
8835997 Low extension dose implants in SRAM fabrication Leland Chang, Shih-Hsien Lo, Jeffrey W. Sleight 2014-09-16
8823064 Asymmetric FET formed through use of variable pitch gate for use as logic device and test structure Josephine B. Chang, Isaac Lauer, Jeffrey W. Sleight 2014-09-02
8822278 Asymmetric FET formed through use of variable pitch gate for use as logic device and test structure Josephine B. Chang, Isaac Lauer, Jeffrey W. Sleight 2014-09-02
8822295 Low extension dose implants in SRAM fabrication Leland Chang, Shih-Hsien Lo, Jeffrey W. Sleight 2014-09-02
8816327 Nanowire efuses Josephine B. Chang, Isaac Lauer, Jeffrey W. Sleight 2014-08-26
8802535 Doped core trigate FET structure and method Sarunya Bangsaruntip, Siyuranga O. Koswatta, Jeffrey W. Sleight 2014-08-12
8806419 Apparatus for modeling of FinFET width quantization Wilfried Ernest-August Haensch, Philip J. Oldiges, Hailing Wang, Richard Q. Williams 2014-08-12
8799848 Methods for modeling of FinFET width quantization Wilfried Ernest-August Haensch, Philip J. Oldiges, Hailing Wang, Richard Q. Williams 2014-08-05
8741730 Bi-directional self-aligned FET capacitor Leland Chang, Brian L. Ji, Jeffrey W. Sleight 2014-06-03
8742475 Field effect transistor device and fabrication Dechao Guo, Shu-Jen Han, Yanfeng Wang 2014-06-03
8742511 Double gate planar field effect transistors Josephine B. Chang, Leland Chang, Jeffrey W. Sleight 2014-06-03
8736023 Field effect transistor device and fabrication Dechao Guo, Shu-Jen Han, Yanfeng Wang 2014-05-27
8722472 Hybrid CMOS nanowire mesh device and FINFET device Josephine B. Chang, Leland Chang, Jeffrey W. Sleight 2014-05-13