CL

Chung-Hsun Lin

IBM: 115 patents #445 of 70,183Top 1%
Globalfoundries: 14 patents #253 of 4,424Top 6%
IN Intel: 14 patents #2,910 of 30,777Top 10%
TE Tessera: 2 patents #162 of 271Top 60%
KT Kabushiki Kaisha Toshiba: 1 patents #13,537 of 21,451Top 65%
NU National Taiwan University: 1 patents #729 of 2,195Top 35%
📍 Portland, OR: #51 of 9,213 inventorsTop 1%
🗺 Oregon: #99 of 28,073 inventorsTop 1%
Overall (All Time): #6,270 of 4,157,543Top 1%
149
Patents All Time

Issued Patents All Time

Showing 51–75 of 149 patents

Patent #TitleCo-InventorsDate
9385026 Sublithographic Kelvin structure patterned with DSA Josephine B. Chang, Michael A. Guillorn, HsinYu Tsai 2016-07-05
9385027 Sublithographic Kelvin structure patterned with DSA Josephine B. Chang, Michael A. Guillorn, HsinYu Tsai 2016-07-05
9324801 Nanowire FET with tensile channel stressor Isaac Lauer, Jeffrey W. Sleight 2016-04-26
9281397 Semiconductor device including an asymmetric feature Josephine B. Chang, Isaac Lauer, Jeffrey W. Sleight 2016-03-08
9250204 Graphene sensor Dechao Guo, Shu-Jen Han, Ning Su 2016-02-02
9230989 Hybrid CMOS nanowire mesh device and FINFET device Josephine B. Chang, Leland Chang, Jeffrey W. Sleight 2016-01-05
9214529 Fin Fet device with independent control gate Josephine B. Chang, Michael A. Guillorn 2015-12-15
9190419 Diode structure and method for FINFET technologies Josephine B. Chang, Isaac Lauer, Jeffrey W. Sleight 2015-11-17
9177923 Through-substrate via shielding Daeik Daniel Kim, Chandrasekharan Kothandaraman, John M. Safran 2015-11-03
9157887 Graphene sensor Dechao Guo, Shu-Jen Han, Ning Su 2015-10-13
9087909 Hybrid extremely thin silicon-on-insulator (ETSOI) structure to minimize noise coupling from TSV Yu-Shiang Lin, Shih-Hsien Lo, Joel A. Silberman 2015-07-21
9070698 Through-substrate via shielding Daeik Daniel Kim, Chandrasekharan Kothandaraman, John M. Safran 2015-06-30
9068936 Graphene sensor Dechao Guo, Shu-Jen Han, Ning Su 2015-06-30
9064739 Techniques for quantifying fin-thickness variation in FINFET technology Wilfried Haensch, Philip J. Oldiges, Kern Rim 2015-06-23
9058441 Methods for modeling of FinFET width quantization Wilfried Ernest-August Haensch, Philip J. Oldiges, Hailing Wang, Richard Q. Williams 2015-06-16
9059289 Stringer-free gate electrode for a suspended semiconductor fin Josephine B. Chang, Isaac Lauer, Jeffrey W. Sleight 2015-06-16
9053981 Hybrid CMOS nanowire mesh device and PDSOI device Josephine B. Chang, Leland Chang, Jeffrey W. Sleight 2015-06-09
9041057 Field effect transistor device with shaped conduction channel Dechao Guo, Shu-Jen Han 2015-05-26
9029213 Stringer-free gate electrode for a suspended semiconductor fin Josephine B. Chang, Isaac Lauer, Jeffrey Sleight 2015-05-12
9018084 Tapered fin field effect transistor Josephine B. Chang, Michael A. Guillorn, Ryan M. Martin, Jeffrey W. Sleight 2015-04-28
9006087 Diode structure and method for wire-last nanomesh technologies Josephine B. Chang, Isaac Lauer, Jeffrey W. Sleight 2015-04-14
8994108 Diode structure and method for wire-last nanomesh technologies Josephine B. Chang, Isaac Lauer, Jeffrey W. Sleight 2015-03-31
8981478 Recessed source and drain regions for FinFETs Josephine B. Chang, Paul Chang, Michael A. Guillorn, Jeffrey W. Sleight 2015-03-17
8969187 Self-aligned contacts Dechao Guo, Wilfried Haensch, Shu-Jen Han 2015-03-03
8969964 Embedded silicon germanium N-type field effect transistor for reduced floating body effect Leland Chang, Isaac Lauer, Jeffrey W. Sleight 2015-03-03