AC

Ashima B. Chakravarti

IBM: 37 patents #2,596 of 70,183Top 4%
Infineon Technologies Ag: 2 patents #3,160 of 7,486Top 45%
Applied Materials: 1 patents #4,780 of 7,310Top 70%
GP Globalfoundries Singapore Pte.: 1 patents #427 of 828Top 55%
NS Novellus Systems: 1 patents #479 of 780Top 65%
Lam Research: 1 patents #1,364 of 2,128Top 65%
📍 Hopewell Junction, NY: #49 of 648 inventorsTop 8%
🗺 New York: #2,966 of 115,490 inventorsTop 3%
Overall (All Time): #90,706 of 4,157,543Top 3%
37
Patents All Time

Issued Patents All Time

Showing 26–37 of 37 patents

Patent #TitleCo-InventorsDate
6555166 Method for reducing the microloading effect in a chemical vapor deposition reactor Oleg Gluschenkov 2003-04-29
6528383 Simultaneous formation of deep trench capacitor and resistor Satya N. Chakravarti, Irene McStay, Kwong Hon Wong 2003-03-04
6500772 Methods and materials for depositing films on semiconductor substrates Richard A. Conti, Chester T. Dziobkowski, Thomas Ivers, Paul C. Jamison, Frank V. Liucci 2002-12-31
6436760 Method for reducing surface oxide in polysilicon processing Kwong Hon Wong, Satya N. Chakravarti, Subramanian S. Iyer 2002-08-20
6429149 Low temperature LPCVD PSG/BPSG process Richard A. Conti, Laertis Economikos, Byeongju Park 2002-08-06
6204112 Process for forming a high density semiconductor device Satya N. Chakravarti, James G. Ryan 2001-03-20
6159870 Borophosphosilicate glass incorporated with fluorine for low thermal budget gap fill Richard A. Conti, Frank V. Liucci, Darryl D. Restaino 2000-12-12
6077786 Methods and apparatus for filling high aspect ratio structures with silicate glass Richard A. Conti, Donna R. Cote, Frank V. Liucci, Son V. Nguyen 2000-06-20
6057250 Low temperature reflow dielectric-fluorinated BPSG Markus Kirchhoff, Matthias Ilg, Kevin A. McKinley, Son V. Nguyen, Michael J. Shapiro 2000-05-02
6030881 High throughput chemical vapor deposition process capable of filling high aspect ratio structures George D. Papasouliotis, Richard A. Conti, Laertis Economikos, Patrick A. Van Cleemput 2000-02-29
5909044 Process for forming a high density semiconductor device Satya N. Chakravarti, James G. Ryan 1999-06-01
5643640 Fluorine doped plasma enhanced phospho-silicate glass, and process Terry M. Cheng, Son Van Nguyen, Michael J. Shapiro 1997-07-01