Issued Patents All Time
Showing 26–50 of 67 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 7276707 | Deflector, method of manufacturing deflector, and charged particle beam exposure apparatus | Yuichi Iwasaki, Masato Muraki, Kenji Tamamori, Kouji Asano, Masayoshi Esashi +2 more | 2007-10-02 |
| 7198039 | Valve control device reducing noise | Eiji Takemoto, Masato Katsuno, Tatsuya Fujita, Kunio Nanba | 2007-04-03 |
| 7109494 | Deflector, method of manufacturing deflector, and charged particle beam exposure apparatus using deflector | Haruhito Ono, Masatake Akaike, Kenji Tamamori, Futoshi Hirose, Yasushi Koyama +2 more | 2006-09-19 |
| 7105842 | Method of charged particle beam lithography and equipment for charged particle beam lithography | Sayaka Tanimoto, Yasunari Sohda, Osamu Kamimura, Haruo Yoda, Masaki Hosoda | 2006-09-12 |
| 7098464 | Electron beam writing equipment and electron beam writing method | Yasunari Sohda, Osamu Kamimura, Sayaka Tanimoto, Masato Muraki | 2006-08-29 |
| 7078691 | Standard reference for metrology and calibration method of electron-beam metrology system using the same | — | 2006-07-18 |
| 7034321 | Electron beam exposure apparatus and electron beam measurement module | Masaki Takakuwa, Gen Nakamura | 2006-04-25 |
| 7015482 | Electron beam writing equipment using plural beams and method | Yasunari Sohda, Osamu Kamimura, Masato Muraki, Masaki Takakuwa | 2006-03-21 |
| 6953938 | Deflector, method of manufacturing deflector, and charged particle beam exposure apparatus | Yuichi Iwasaki, Masato Muraki, Kenji Tamamori, Kouji Asano, Masayoshi Esashi +2 more | 2005-10-11 |
| 6946665 | Charged particle beam exposure method and apparatus and device manufacturing method using the apparatus | Masato Muraki, Hiroya Ohta, Haruo Yoda, Norio Saitou | 2005-09-20 |
| 6946662 | Multi-charged beam lens, charged-particle beam exposure apparatus using the same, and device manufacturing method | Haruhito Ono, Kenichi Nagae, Masaki Takakuwa, Harunobu Muto | 2005-09-20 |
| 6818911 | Array structure and method of manufacturing the same, charged particle beam exposure apparatus, and device manufacturing method | Kenji Tamamori, Masato Muraki, Yuichi Iwasaki, Kouji Asano, Yoshiaki Moro +1 more | 2004-11-16 |
| 6768118 | Electron beam monitoring sensor and electron beam monitoring method | Yasunari Sohda, Hiroya Ohta, Norio Saitou, Masato Muraki, Masaki Takakuwa | 2004-07-27 |
| 6583431 | Charged particle beam lithography apparatus for forming pattern on semi-conductor | Hiroyuki Ito, Yasunari Sohda, Yasuhiro Someda, Masahide Okumura, Hidetoshi Satoh | 2003-06-24 |
| 6555833 | Charged particle beam lithography apparatus for forming pattern on semi-conductor | Hiroyuki Ito, Yasunari Sohda, Yasuhiro Someda, Masahide Okumura, Hidetoshi Satoh | 2003-04-29 |
| 6518656 | Reduced thickness optical image pickup device with improved sealing and method of making same | Hirokazu Nakayoshi | 2003-02-11 |
| 6511048 | Electron beam lithography apparatus and pattern forming method | Yasunari Sohda, Yasuhiro Someda, Hiroya Ohta, Takashi Matsuzaka, Norio Saitou | 2003-01-28 |
| 6509572 | Charged particle beam lithography apparatus for forming pattern on semi-conductor | Hiroyuki Ito, Yasunari Sohda, Yasuhiro Someda, Masahide Okumura, Hidetoshi Satoh | 2003-01-21 |
| 6441383 | Charged particle beam lithography apparatus for forming pattern on semi-conductor | Hiroyuki Ito, Yasunari Sohda, Yasuhiro Someda, Masahide Okumura, Hidetoshi Satoh | 2002-08-27 |
| 6329665 | Charged particle beam lithography apparatus for forming pattern on semi-conductor | Hiroyuki Ito, Yasunari Sohda, Yasuhiro Someda, Masahide Okumura, Hidetoshi Satoh | 2001-12-11 |
| 6320198 | Charged particle beam lithography apparatus for forming pattern on semi-conductor | Hiroyuki Ito, Yasunari Sohda, Yasuhiro Someda, Masahide Okumura, Hidetoshi Satoh | 2001-11-20 |
| 6262428 | Charged particle beam lithography apparatus for forming pattern on semi-conductor | Hiroyuki Ito, Yasunari Sohda, Yasuhiro Someda, Masahide Okumura, Hidetoshi Satoh | 2001-07-17 |
| 6159644 | Method of fabricating semiconductor circuit devices utilizing multiple exposures | Hidetoshi Satoh, Masahide Okumura, Hiroya Ohta, Norio Saitou | 2000-12-12 |
| 6121625 | Charged particle beam lithography apparatus for forming pattern on semi-conductor | Hiroyuki Ito, Yasunari Sohda, Yasuhiro Someda, Masahide Okumura, Hidetoshi Satoh | 2000-09-19 |
| 5974394 | Schedule retrieval method for controlling schedules and schedule server apparatus with multistageous idle-time retrieval means | Tadashi Miyazaki | 1999-10-26 |