AK

Andreas Knorr

Globalfoundries: 34 patents #73 of 4,424Top 2%
Infineon Technologies Ag: 16 patents #716 of 7,486Top 10%
IBM: 13 patents #8,581 of 70,183Top 15%
BG Bhs Corrugated Maschinen-Und Anlagenbau Gmbh: 5 patents #12 of 68Top 20%
GU Globalfoundries U.S.: 4 patents #133 of 665Top 20%
SA Siemens Aktiengesellschaft: 1 patents #10,653 of 22,248Top 50%
AM AMD: 1 patents #5,683 of 9,279Top 65%
GP Globalfoundries Singapore Pte.: 1 patents #427 of 828Top 55%
📍 Saratoga Springs, NY: #7 of 363 inventorsTop 2%
🗺 New York: #1,187 of 115,490 inventorsTop 2%
Overall (All Time): #32,637 of 4,157,543Top 1%
66
Patents All Time

Issued Patents All Time

Showing 26–50 of 66 patents

Patent #TitleCo-InventorsDate
9257325 Semiconductor structures and methods for forming isolation between Fin structures of FinFET devices Frank Scott Johnson 2016-02-09
9245885 Methods of forming lateral and vertical FinFET devices and the resulting product Ruilong Xie 2016-01-26
9147730 Methods of forming fins for FinFET semiconductor devices and selectively removing some of the fins by performing a cyclical fin cutting process Ruilong Xie, Ajey Poovannummoottil Jacob, Michael Hargrove 2015-09-29
9147748 Methods of forming replacement spacer structures on semiconductor devices Ruilong Xie, Xiuyu Cai, Ajey Poovannummoottil Jacob, Christopher M. Prindle 2015-09-29
9048171 Method to dynamically tune precision resistance Steven R. Soss 2015-06-02
9000534 Method for forming and integrating metal gate transistors having self-aligned contacts and related structure Frank Scott Johnson 2015-04-07
8779529 Self-aligned silicidation for replacement gate process Indradeep Sen, Thorsten Kammler, Akif Sultan 2014-07-15
8729609 Integrated circuits including multi-gate transistors locally interconnected by continuous fin structure and methods for the fabrication thereof Frank Scott Johnson 2014-05-20
8709882 Method to dynamically tune precision resistance Steven R. Soss 2014-04-29
8533651 Providing conversion of a planar design to a FinFET design Soon Yoeng Tan, Angeline Ho, Hendry Renaldo, Scott Johnson 2013-09-10
8361870 Self-aligned silicidation for replacement gate process Indradeep Sen, Thorsten Kammler, Akif Sultan 2013-01-29
8048790 Method for self-aligning a stop layer to a replacement gate for self-aligned contact integration Steven R. Soss 2011-11-01
8039326 Methods for fabricating bulk FinFET devices having deep trench isolation Frank Scott Johnson 2011-10-18
7626257 Semiconductor devices and methods of manufacture thereof 2009-12-01
7601645 Methods for fabricating device features having small dimensions Doug H. Lee 2009-10-13
7297636 Methods for fabricating device features having small dimensions Doug H. Lee 2007-11-20
7273638 High density plasma oxidation Michael P. Belyansky, Oleg Glushenkov 2007-09-25
7256148 Method for treating a wafer edge Bernd Kastenmeier 2007-08-14
7157373 Sidewall sealing of porous dielectric materials Bernd Kastenmeier 2007-01-02
7125782 Air gaps between conductive lines for reduced RC delay of integrated circuits Bernd Kastenmeier, Naim Moumen 2006-10-24
7091103 TEOS assisted oxide CMP process Jochen Beintner, Laertis Economikos, Michael Wise 2006-08-15
6946345 Self-aligned buried strap process using doped HDP oxide Jochen Beintner, Wolfgang Bergner, Richard A. Conti, Rolf Weis 2005-09-20
6933206 Trench isolation employing a high aspect ratio trench Jochen Beintner 2005-08-23
6914015 HDP process for high aspect ratio gap filling Michael P. Belyansky, Patricia Argandona, Gregory DiBello, Daewon Yang 2005-07-05
6890833 Trench isolation employing a doped oxide trench fill Michael P. Belyansky, Oleg Gluschenkov, Christopher C. Parks 2005-05-10