Issued Patents All Time
Showing 1–25 of 50 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 6242751 | Charged-particle-beam exposure device and charged-particle-beam exposure method | Akio Takemoto, Yoshihisa Ooaeh, Tomohiko Abe, Hiroshi Yasuda, Takamasa Satoh +7 more | 2001-06-05 |
| 6222195 | Charged-particle-beam exposure device and charged-particle-beam exposure method | Akio Yamada, Satoru Sagou, Hitoshi Watanabe, Satoru Yamazaki, Manabu Ohno +2 more | 2001-04-24 |
| 6137111 | Charged particle-beam exposure device and charged-particle-beam exposure method | Akio Yamada, Satoru Sagou, Hitoshi Watanabe, Satoru Yamazaki, Manabu Ohno +2 more | 2000-10-24 |
| 6090527 | Electron beam exposure mask and method of manufacturing the same and electron beam exposure method | Satoru Yamazaki, Hiroshi Yasuda, Takayuki Sakakibara, Satoru Sagoh | 2000-07-18 |
| 6087048 | Method of producing block mask for electron-beam lithography apparatuses | Yoshio Suzaki, Takayuki Sakakibara | 2000-07-11 |
| 5969365 | Charged-particle-beam exposure device and charged-particle-beam exposure method | Akio Takemoto, Yoshihisa Ooaeh, Tomohiko Abe, Hiroshi Yasuda, Takamasa Satoh +7 more | 1999-10-19 |
| 5965895 | Method of providing changed particle beam exposure in which representative aligning marks on an object are detected to calculate an actual position to perform exposure | Takamasa Satoh, Hiroshi Yasuda, Junichi Kai, Yoshihisa Oae, Hisayasu Nishino +8 more | 1999-10-12 |
| 5952155 | Mask and method of creating mask as well as electron-beam exposure method and electron-beam exposure device | Takayuki Sakakibara, Satoru Sagoh, Satoru Yamazaki, Hiroshi Yasuda | 1999-09-14 |
| 5849437 | Electron beam exposure mask and method of manufacturing the same and electron beam exposure method | Satoru Yamazaki, Hiroshi Yasuda, Takayuki Sakakibara, Satoru Sagoh | 1998-12-15 |
| 5830612 | Method of detecting a deficiency in a charged-particle-beam exposure mask | Akio Yamada, Satoru Sagou, Hitoshi Watanabe, Satoru Yamazaki, Manabu Ohno +2 more | 1998-11-03 |
| 5824437 | Mask and method of creating mask as well as electron-beam exposure method and electron-beam exposure device | Takayuki Sakakibara, Satoru Sagoh, Satoru Yamazaki, Hiroshi Yasuda | 1998-10-20 |
| 5757015 | Charged-particle-beam exposure device and charged-particle-beam exposure method | Akio Takemoto, Yoshihisa Ooaeh, Tomohiko Abe, Hiroshi Yasuda, Takamasa Satoh +7 more | 1998-05-26 |
| 5721432 | Method of and system for charged particle beam exposure | Takamasa Satoh, Hiroshi Yasuda, Junichi Kai, Yoshihisa Oae, Hisayasu Nishino +8 more | 1998-02-24 |
| 5719402 | Method of and system for charged particle beam exposure | Takamasa Satoh, Hiroshi Yasuda, Junichi Kai, Yoshihisa Oae, Hisayasu Nishino +8 more | 1998-02-17 |
| 5590048 | Block exposure pattern data extracting system and method for charged particle beam exposure | Tomohiko Abe, Hiroshi Yasuda, Yoshihisa Oae | 1996-12-31 |
| 5546319 | Method of and system for charged particle beam exposure | Takamasa Satoh, Hiroshi Yasuda, Junichi Kai, Yoshihisa Oae, Hisayasu Nishino +8 more | 1996-08-13 |
| 5537487 | Pattern judging method, mask producing method, and method of dividing block pattern for use in block exposure | Masaaki Miyajima, Hiroshi Yasuda, Satoru Yamazaki | 1996-07-16 |
| 5432314 | Transparent mask plate for charged particle beam exposure apparatus and charged particle beam exposure process using the transparent mask plate | Satoru Yamazaki, Yoshihisa Oae, Akio Yamada | 1995-07-11 |
| 5422491 | Mask and charged particle beam exposure method using the mask | — | 1995-06-06 |
| 5401974 | Charged particle beam exposure apparatus and method of cleaning the same | Yoshihisa Oae, Takamasa Satoh, Yasushi Takahashi, Hiroshi Yasuda, Soichiro Arai +1 more | 1995-03-28 |
| 5393988 | Mask and charged particle beam exposure method using the mask | — | 1995-02-28 |
| 5391886 | Charged particle beam exposure system and method of exposing a pattern on an object by such a charged particle beam exposure system | Akio Yamada, Yoshihisa Oae, Satoru Yamazaki, Tomohiko Abe, Katsuhiko Kobayashi +1 more | 1995-02-21 |
| 5376802 | Stencil mask and charge particle beam exposure method and apparatus using the stencil mask | Yasushi Takahashi, Yoshihisa Oae, Hiroshi Yasuda | 1994-12-27 |
| 5364718 | Method of exposing patttern of semiconductor devices and stencil mask for carrying out same | Yoshihisa Oae | 1994-11-15 |
| 5349197 | Method for exposing a pattern on an object by a charged particle beam | Hiroshi Yasuda | 1994-09-20 |