Issued Patents All Time
Showing 1–25 of 46 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 8992086 | X-Y constraining unit, and stage apparatus and vacuum stage apparatus including the same | Kouji Akashi, Youichi Shimizu | 2015-03-31 |
| 8382911 | Stage device and stage cleaning method | Youichi Shimizu | 2013-02-26 |
| 8281794 | Stage device and stage cleaning method | Youichi Shimizu | 2012-10-09 |
| 6646275 | Charged particle beam exposure system and method | Tomohiko Abe, Soichiro Arai, Shigeru Maruyama, Hiroshi Yasuda, Kenichi Miyazawa +4 more | 2003-11-11 |
| 6486479 | Charged particle beam exposure system and method | Tomohiko Abe, Soichiro Arai, Shigeru Maruyama, Hiroshi Yasuda, Kenichi Miyazawa +4 more | 2002-11-26 |
| 6118129 | Method and system for exposing an exposure pattern on an object by a charged particle beam which is shaped into a plurality of beam elements | Tomohiko Abe, Soichiro Arai, Shigeru Maruyama, Hiroshi Yasuda, Kenichi Miyazawa +4 more | 2000-09-12 |
| 6064807 | Charged-particle beam exposure system and method | Soichiro Arai, Junichi Kai, Hiroshi Yasuda, Shunsuke Hueki | 2000-05-16 |
| 5977548 | Charged particle beam exposure system and method | Tomohiko Abe, Soichiro Arai, Shigeru Maruyama, Hiroshi Yasuda, Kenichi Miyazawa +4 more | 1999-11-02 |
| 5965895 | Method of providing changed particle beam exposure in which representative aligning marks on an object are detected to calculate an actual position to perform exposure | Takamasa Satoh, Hiroshi Yasuda, Junichi Kai, Hisayasu Nishino, Kiichi Sakamoto +8 more | 1999-10-12 |
| 5920077 | Charged particle beam exposure system | Tomohiko Abe, Soichiro Arai, Shigeru Maruyama, Hiroshi Yasuda, Kenichi Miyazawa +4 more | 1999-07-06 |
| 5841145 | Method of and system for exposing pattern on object by charged particle beam | Takamasa Satoh, Soichiro Arai, Kenichi Miyazawa, Hiroshi Yasuda, Manabu Ohno +5 more | 1998-11-24 |
| 5721432 | Method of and system for charged particle beam exposure | Takamasa Satoh, Hiroshi Yasuda, Junichi Kai, Hisayasu Nishino, Kiichi Sakamoto +8 more | 1998-02-24 |
| 5719402 | Method of and system for charged particle beam exposure | Takamasa Satoh, Hiroshi Yasuda, Junichi Kai, Hisayasu Nishino, Kiichi Sakamoto +8 more | 1998-02-17 |
| 5631113 | Electron-beam exposure system for reduced distortion of electron beam spot | Takamasa Satoh, Hiroshi Yasuda, Akio Yamada, Junichi Kai, Keiji Yamada +1 more | 1997-05-20 |
| 5614725 | Charged particle beam exposure system and method | Tomohiko Abe, Soichiro Arai, Shigeru Maruyama, Hiroshi Yasuda, Kenichi Miyazawa +4 more | 1997-03-25 |
| 5590048 | Block exposure pattern data extracting system and method for charged particle beam exposure | Tomohiko Abe, Hiroshi Yasuda, Kiichi Sakamoto | 1996-12-31 |
| 5546319 | Method of and system for charged particle beam exposure | Takamasa Satoh, Hiroshi Yasuda, Junichi Kai, Hisayasu Nishino, Kiichi Sakamoto +8 more | 1996-08-13 |
| 5528048 | Charged particle beam exposure system and method | Tomohiko Abe, Soichiro Arai, Shigeru Maruyama, Hiroshi Yasuda, Kenichi Miyazawa +4 more | 1996-06-18 |
| 5449915 | Electron beam exposure system capable of detecting failure of exposure | Akio Yamada | 1995-09-12 |
| 5444257 | Electron-beam exposure system for reduced distortion of electron beam spot | Takamasa Satoh, Hiroshi Yasuda, Akio Yamada, Junichi Kai, Keiji Yamada +1 more | 1995-08-22 |
| 5432314 | Transparent mask plate for charged particle beam exposure apparatus and charged particle beam exposure process using the transparent mask plate | Satoru Yamazaki, Kiichi Sakamoto, Akio Yamada | 1995-07-11 |
| 5430304 | Blanking aperture array type charged particle beam exposure | Hiroshi Yasuda, Yasushi Takahashi, Tomohiko Abe, Shunsuke Fueki | 1995-07-04 |
| 5420433 | Charged particle beam exposure apparatus | Yasushi Takahashi, Hiroshi Yasuda | 1995-05-30 |
| 5404018 | Method of and an apparatus for charged particle beam exposure | Hiroshi Yasuda, Akio Yamada, Nobuyuki Yasutake, Hisayasu Nishino | 1995-04-04 |
| 5401974 | Charged particle beam exposure apparatus and method of cleaning the same | Takamasa Satoh, Yasushi Takahashi, Kiichi Sakamoto, Hiroshi Yasuda, Soichiro Arai +1 more | 1995-03-28 |