Issued Patents All Time
Showing 26–46 of 46 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 5399872 | Charged-particle beam exposure method | Hiroshi Yasuda, Junichi Kai, Hisayasu Nishino, Soichiro Arai | 1995-03-21 |
| 5391886 | Charged particle beam exposure system and method of exposing a pattern on an object by such a charged particle beam exposure system | Akio Yamada, Satoru Yamazaki, Tomohiko Abe, Katsuhiko Kobayashi, Kiichi Sakamoto +1 more | 1995-02-21 |
| 5382800 | Charged particle beam exposure method and apparatus | Hisayasu Nishino, Akio Yamada, Hiroshi Yasuda | 1995-01-17 |
| 5376802 | Stencil mask and charge particle beam exposure method and apparatus using the stencil mask | Kiichi Sakamoto, Yasushi Takahashi, Hiroshi Yasuda | 1994-12-27 |
| 5369282 | Electron beam exposure method and system for exposing a pattern on a substrate with an improved accuracy and throughput | Soichiro Arai, Hiroshi Yasuda, Junichi Kai | 1994-11-29 |
| 5364718 | Method of exposing patttern of semiconductor devices and stencil mask for carrying out same | Kiichi Sakamoto | 1994-11-15 |
| 5359202 | Electron beam exposure apparatus employing blanking aperture array | Hiroshi Yasuda, Tomohiko Abe | 1994-10-25 |
| 5338939 | Charged particle beam exposure including a heat blocking partition positioned near deflecting coils | Hisayasu Nishino, Akio Yamada, Hiroshi Yasuda | 1994-08-16 |
| 5304811 | Lithography system using charged-particle beam and method of using the same | Akio Yamada, Satoru Yamazaki, Tomohiko Abe | 1994-04-19 |
| 5288567 | Stencil mask and charged particle beam exposure method and apparatus using the stencil mask | Kiichi Sakamoto, Yasushi Takahashi, Hiroshi Yasuda | 1994-02-22 |
| 5276331 | Electron beam exposure system | Kiichi Sakamoto | 1994-01-04 |
| 5272347 | Apparatus for adjusting a focal position of an electron beam and electron beam projection apparatus including the same | Akio Yamada, Hiroshi Yasuda | 1993-12-21 |
| 5264706 | Electron beam exposure system having an electromagnetic deflector configured for efficient cooling | Akio Yamada, Hiroshi Yasuda | 1993-11-23 |
| 5260579 | Charged particle beam exposure system and charged particle beam exposure method | Hiroshi Yasuda, Yasushi Takahashi, Kiichi Sakamoto, Akio Yamada, Junichi Kai +2 more | 1993-11-09 |
| 5245194 | Electron beam exposure system having an electrostatic deflector wherein an electrostatic charge-up is eliminated | Hiroshi Yasuda | 1993-09-14 |
| 5223719 | Mask for use in a charged particle beam apparatus including beam passing sections | Yasushi Takahashi, Kiichi Sakamoto, Hiroshi Yasuda, Nobuyuki Yasutake | 1993-06-29 |
| 5194741 | Method for writing a pattern on an object by a focused electron beam with an improved efficiency | Kiichi Sakamoto, Junko Hatta, Yasushi Takahashi | 1993-03-16 |
| 5180919 | Electron beam exposure system having the capability of checking the pattern of an electron mask used for shaping an electron beam | Kiichi Sakamoto, Hiroshi Yasuda | 1993-01-19 |
| 5130547 | Charged-particle beam exposure method and apparatus | Kiichi Sakamoto, Shunsuke Fueki, Akio Yamada, Hiroshi Yasuda | 1992-07-14 |
| 5117117 | Electron beam exposure system having an improved seal element for interfacing electric connections | Kiichi Sakamoto, Akio Yamada | 1992-05-26 |
| 5041731 | Deflection compensating device for converging lens | Akio Yamada | 1991-08-20 |