Issued Patents All Time
Showing 26–50 of 50 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 5347592 | Pattern judging method and mask producing method using the pattern judging method | Hiroshi Yasuda, Satoru Yamazaki | 1994-09-13 |
| 5288567 | Stencil mask and charged particle beam exposure method and apparatus using the stencil mask | Yasushi Takahashi, Yoshihisa Oae, Hiroshi Yasuda | 1994-02-22 |
| 5276334 | Charged particle beam exposure method and apparatus | Akio Yamada, Kenichi Kawashima | 1994-01-04 |
| 5276331 | Electron beam exposure system | Yoshihisa Oae | 1994-01-04 |
| 5262341 | Blanking aperture array and charged particle beam exposure method | Shunsuke Fueki, Hiroshi Yasuda, Yasushi Takahashi | 1993-11-16 |
| 5260579 | Charged particle beam exposure system and charged particle beam exposure method | Hiroshi Yasuda, Yasushi Takahashi, Akio Yamada, Yoshihisa Oae, Junichi Kai +2 more | 1993-11-09 |
| 5256881 | Mask and charged particle beam exposure method using the mask | Satoru Yamazaki, Hiroshi Yasuda | 1993-10-26 |
| 5234781 | Mask for lithographic patterning and a method of manufacturing the same | Hiroshi Yasuda | 1993-08-10 |
| 5225684 | Charged particle beam exposure apparatus control system and a method of operation for providing a drawing start signal | Kazutaka Taki, Hiroshi Yasuda, Junichi Kai, Atsushi Saito | 1993-07-06 |
| 5223719 | Mask for use in a charged particle beam apparatus including beam passing sections | Yasushi Takahashi, Yoshihisa Oae, Hiroshi Yasuda, Nobuyuki Yasutake | 1993-06-29 |
| 5194741 | Method for writing a pattern on an object by a focused electron beam with an improved efficiency | Yoshihisa Oae, Junko Hatta, Yasushi Takahashi | 1993-03-16 |
| 5180919 | Electron beam exposure system having the capability of checking the pattern of an electron mask used for shaping an electron beam | Yoshihisa Oae, Hiroshi Yasuda | 1993-01-19 |
| 5175435 | Electron beam exposure system with increased efficiency of exposure operation | Shunsuke Fueki, Hiroshi Yasuda | 1992-12-29 |
| 5173582 | Charged particle beam lithography system and method | Hiroshi Yasuda, Akio Yamada | 1992-12-22 |
| 5148033 | Electron beam exposure device and exposure method using the same | Akio Yamada | 1992-09-15 |
| 5144142 | Blanking aperture array, method for producing blanking aperture array, charged particle beam exposure apparatus and charged particle beam exposure method | Shunsuke Fueki, Hiroshi Yasuda, Yasushi Takahashi | 1992-09-01 |
| 5130547 | Charged-particle beam exposure method and apparatus | Yoshihisa Oae, Shunsuke Fueki, Akio Yamada, Hiroshi Yasuda | 1992-07-14 |
| 5118952 | Patterned photo cathode and its fabrication method for electron image projection | Hiroshi Yasuda, Jinko Kudou, Akio Yamada | 1992-06-02 |
| 5117117 | Electron beam exposure system having an improved seal element for interfacing electric connections | Yoshihisa Oae, Akio Yamada | 1992-05-26 |
| 5051556 | Charged particle beam lithography system and a method thereof | Hiroshi Yasuda, Akio Yamada | 1991-09-24 |
| 5036209 | Fabrication method for semiconductor devices and transparent mask for charged particle beam | Toyotaka Kataoka | 1991-07-30 |
| 5029222 | Photoelectron image projection apparatus | Akio Yamada, Hiroshi Yasuda, Jinko Kudou | 1991-07-02 |
| 5023462 | Photo-cathode image projection apparatus for patterning a semiconductor device | Akio Yamada, Jinko Kudou, Hiroshi Yasuda | 1991-06-11 |
| 4980567 | Charged particle beam exposure system using line beams | Hiroshi Yasuda, Junichi Kai, Toyotaka Kataoka, Yasushi Takahashi, Shinji Miyaki | 1990-12-25 |
| 4954717 | Photoelectron mask and photo cathode image projection method using the same | Hiroshi Yasuda, Akio Yamada, Jinko Kudou | 1990-09-04 |