| 9239269 |
Calibration of photoelectromagnetic sensor in a laser source |
Rong (Lauren) Liu, Robert Jay Rafac, Robert A. Bergstedt, Paul Alexander McKenzie |
2016-01-19 |
| 9239268 |
Calibration of photoelectromagnetic sensor in a laser source |
Rong (Lauren) Liu, Robert Jay Rafac, Robert A. Bergstedt, Paul Alexander McKenzie |
2016-01-19 |
| 7567607 |
Very narrow band, two chamber, high rep-rate gas discharge laser system |
David S. Knowles, Daniel J. W. Brown, Herve A. Besaucele, Alexander I. Ershov, William N. Partlo +10 more |
2009-07-28 |
| 7323703 |
EUV light source |
I. Roger Oliver, William N. Partlo, Igor V. Fomenkov, Alexander I. Ershov, Norbert Bowering +1 more |
2008-01-29 |
| 7317196 |
LPP EUV light source |
William N. Partlo, Daniel J. W. Brown, Igor V. Fomenkov, Alexander I. Ershov |
2008-01-08 |
| 7218661 |
Line selected F2 two chamber laser system |
David S. Knowles, Daniel J. W. Brown, Richard L. Sandstrom, German E. Rylov, Eckehard D. Onkels +8 more |
2007-05-15 |
| 7164144 |
EUV light source |
William N. Partlo, Norbert Bowering, Alexander I. Ershov, Igor V. Fomenkov, Ian Roger Oliver +2 more |
2007-01-16 |
| 7141806 |
EUV light source collector erosion mitigation |
William N. Partlo, Alexander I. Ershov, Igor V. Fomenkov, William Oldham |
2006-11-28 |
| 7061961 |
Very narrow band, two chamber, high rep-rate gas discharge laser system |
David S. Knowles, Daniel J. W. Brown, Herve A. Besaucele, Alexander I. Ershov, William N. Partlo +10 more |
2006-06-13 |
| 7058107 |
Line selected F2 two chamber laser system |
David S. Knowles, Daniel J. W. Brown, Richard L. Sandstrom, German E. Rylov, Eckehard D. Onkels +8 more |
2006-06-06 |
| 6801560 |
Line selected F2 two chamber laser system |
David S. Knowles, Daniel J. W. Brown, Richard L. Sandstrom, German E. Rylov, Eckehard D. Onkels +8 more |
2004-10-05 |
| 6625191 |
Very narrow band, two chamber, high rep rate gas discharge laser system |
David S. Knowles, Daniel J. W. Brown, Herve A. Besaucele, Alexander I. Ershov, William N. Partlo +10 more |
2003-09-23 |
| 6567450 |
Very narrow band, two chamber, high rep rate gas discharge laser system |
Herve A. Besaucele, Alexander I. Ershov, William N. Partlo, Richard L. Sandstrom, Palash P. Das +7 more |
2003-05-20 |
| 6128323 |
Reliable modular production quality narrow-band high REP rate excimer laser |
Herve A. Besaucele, Palash P. Das, Thomas Patrick Duffey, Alexander I. Ershov, Igor V. Fomenkov +14 more |
2000-10-03 |
| 5525799 |
Portable gas chromatograph-mass spectrometer |
Brian D. Andresen, Joel Del Eckels, James F. Kimmons |
1996-06-11 |
| 5153433 |
Portable mass spectrometer with one or more mechanically adjustable electrostatic sectors and a mechanically adjustable magnetic sector all mounted in a vacuum chamber |
Brian D. Andresen, Joel Del Eckels, James F. Kimmons, Walter H. Martin, Robert F. Keville |
1992-10-06 |
| 4909631 |
Method for film thickness and refractive index determination |
Raul Y. Tan, Robert G. Ozarski, John F. Schipper, Michael Watts |
1990-03-20 |
| 4874240 |
Characterization of semiconductor resist material during processing |
Michael Watts, Thiloma I. Perera, Robert G. Ozarski, John F. Schipper, Raul V. Tan |
1989-10-17 |
| 4857738 |
Absorption measurements of materials |
Robert G. Ozarski, Thiloma I. Perera, John F. Schipper, Raul V. Tan, Michael Watts |
1989-08-15 |