Issued Patents All Time
Showing 26–50 of 95 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 7173262 | Charged particle beam exposure apparatus, charged particle beam exposure method and device manufacturing method | Masaki Hosoda, Osamu Kamimura | 2007-02-06 |
| 7126141 | Electrooptic system array, charged-particle beam exposure apparatus using the same, and device manufacturing method | Haruhito Ono | 2006-10-24 |
| 7098464 | Electron beam writing equipment and electron beam writing method | Yasunari Sohda, Osamu Kamimura, Yoshinori Nakayama, Sayaka Tanimoto | 2006-08-29 |
| 7049610 | Charged particle beam exposure method, charged particle beam exposure apparatus, and device manufacturing method | Haruo Yoda | 2006-05-23 |
| 7038226 | Electrooptic system array, charged-particle beam exposure apparatus using the same, and device manufacturing method | Haruhito Ono | 2006-05-02 |
| 7015482 | Electron beam writing equipment using plural beams and method | Yasunari Sohda, Yoshinori Nakayama, Osamu Kamimura, Masaki Takakuwa | 2006-03-21 |
| 7005659 | Charged particle beam exposure apparatus, charged particle beam exposure method, and device manufacturing method using the same apparatus | Hiroya Ohta, Osamu Kamimura | 2006-02-28 |
| 7005658 | Charged particle beam exposure apparatus and method | — | 2006-02-28 |
| 6969862 | Charged-particle-beam exposure apparatus and method of controlling same | Osamu Kamimura, Masaki Takakuwa | 2005-11-29 |
| 6965153 | Electrooptic system array, charged-particle beam exposure apparatus using the same, and device manufacturing method | Haruhito Ono | 2005-11-15 |
| 6953938 | Deflector, method of manufacturing deflector, and charged particle beam exposure apparatus | Yuichi Iwasaki, Kenji Tamamori, Kouji Asano, Masayoshi Esashi, Yoshinori Nakayama +2 more | 2005-10-11 |
| 6946665 | Charged particle beam exposure method and apparatus and device manufacturing method using the apparatus | Yoshinori Nakayama, Hiroya Ohta, Haruo Yoda, Norio Saitou | 2005-09-20 |
| 6919574 | Electron beam exposure apparatus, deflection apparatus, and electron beam exposure method | Shin Hashimoto, Haruo Yoda | 2005-07-19 |
| 6917045 | Electron beam exposure apparatus, electron beam exposure apparatus calibration method, and semiconductor element manufacturing method | Shin Hashimoto, Haruo Yoda | 2005-07-12 |
| 6903353 | Charged particle beam exposure apparatus, device manufacturing method, and charged particle beam applied apparatus | Yasunari Sohda, Shinichi Hashimoto | 2005-06-07 |
| 6903352 | Charged-particle beam exposure apparatus, charged-particle beam exposure method, control data determination method, and device manufacturing method using this method | Yoshikiyo Yui | 2005-06-07 |
| 6870171 | Exposure apparatus | Masaki Hosoda, Hiroya Ohta, Haruo Yoda | 2005-03-22 |
| 6864488 | Charged particle beam exposure method and apparatus | — | 2005-03-08 |
| 6835937 | Correcting method for correcting exposure data used for a charged particle beam exposure system | Yoshikiyo Yui | 2004-12-28 |
| 6818911 | Array structure and method of manufacturing the same, charged particle beam exposure apparatus, and device manufacturing method | Kenji Tamamori, Yuichi Iwasaki, Yoshinori Nakayama, Kouji Asano, Yoshiaki Moro +1 more | 2004-11-16 |
| 6784442 | Exposure apparatus, control method thereof, and device manufacturing method | Hiroya Ohta, Shin Hashimoto | 2004-08-31 |
| 6777697 | Charged-particle beam exposure apparatus and device manufacturing method using the same | Yoshikiyo Yui | 2004-08-17 |
| 6768118 | Electron beam monitoring sensor and electron beam monitoring method | Yoshinori Nakayama, Yasunari Sohda, Hiroya Ohta, Norio Saitou, Masaki Takakuwa | 2004-07-27 |
| 6657210 | Electron beam exposure method, a method of constructing exposure control data, and a computer-readable medium | — | 2003-12-02 |
| 6636349 | Reflection and refraction optical system and projection exposure apparatus using the same | Kazuhiro Takahashi | 2003-10-21 |