Issued Patents All Time
Showing 26–44 of 44 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 11286564 | Tin-containing precursors and methods of depositing tin-containing films | Mark Saly, David Thompson | 2022-03-29 |
| 11289328 | Deposition and etch processes of chromium-containing thin films for semiconductor manufacturing | Mark Saly, Lakmal C. Kalutarage, David Thompson | 2022-03-29 |
| 11209729 | Vacuum-integrated hardmask processes and apparatus | Jeffrey Marks, George Andrew Antonelli, Richard A. Gottscho, Dennis M. Hausmann, Adrien LaVoie +3 more | 2021-12-28 |
| 11028480 | Methods of protecting metallic components against corrosion using chromium-containing thin films | Mark Saly, David Alexander BRITZ, David Thompson | 2021-06-08 |
| 10831096 | Vacuum-integrated hardmask processes and apparatus | Jeffrey Marks, George Andrew Antonelli, Richard A. Gottscho, Dennis M. Hausmann, Adrien LaVoie +3 more | 2020-11-10 |
| 10804094 | Methods of depositing SiCON with C, O and N compositional control | Mark Saly, David Thompson, Bhaskar Jyoti Bhuyan | 2020-10-13 |
| 10760159 | Methods and apparatus for depositing yttrium-containing films | Lakmal C. Kalutarage, Mark Saly, Benjamin Schmiege, David Thompson | 2020-09-01 |
| 10697060 | Iridium precursors for ALD and CVD thin film deposition and uses thereof | — | 2020-06-30 |
| 10633740 | Methods for depositing coatings on aerospace components | Yuriy Melnik, Sukti Chatterjee, Kaushal Gangakhedkar, Jonathan Frankel, Lance A. Scudder +4 more | 2020-04-28 |
| 10514598 | Vacuum-integrated hardmask processes and apparatus | Jeffrey Marks, George Andrew Antonelli, Richard A. Gottscho, Dennis M. Hausmann, Adrien LaVoie +3 more | 2019-12-24 |
| 10199235 | Liner and barrier applications for subtractive metal integration | Hui-Jung Wu, Nagraj Shankar, Meihua Shen, John Hoang, Prithu Sharma | 2019-02-05 |
| 10106893 | Iridium precursors for ALD and CVD thin film deposition and uses thereof | — | 2018-10-23 |
| 9982344 | Thermally stable volatile precursors | Charles H. Winter | 2018-05-29 |
| 9899234 | Liner and barrier applications for subtractive metal integration | Hui-Jung Wu, Nagraj Shankar, Meihua Shen, John Hoang, Prithu Sharma | 2018-02-20 |
| 9822446 | Thermally stable volatile precursors | Charles H. Winter | 2017-11-21 |
| 9778561 | Vacuum-integrated hardmask processes and apparatus | Jeffrey Marks, George Andrew Antonelli, Richard A. Gottscho, Dennis M. Hausmann, Adrien LaVoie +3 more | 2017-10-03 |
| 9255327 | Thermally stable volatile precursors | Charles H. Winter | 2016-02-09 |
| 9153482 | Methods and apparatus for selective deposition of cobalt in semiconductor processing | Nagraj Shankar, Pramod Subramonium | 2015-10-06 |
| 8962876 | Thermally stable volatile film precursors | Charles H. Winter, Panditha Koralalage Don Mahesh Chinthaka Karunarathne | 2015-02-24 |