Issued Patents All Time
Showing 26–50 of 57 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 7029529 | Method and apparatus for metallization of large area substrates | Kam S. Law, Robert Z. Bachrach, John M. White | 2006-04-18 |
| 7022948 | Chamber for uniform substrate heating | Janine Kardokus, Akihiro Hosokawa | 2006-04-04 |
| 6981508 | On-site cleaning gas generation for process chamber cleaning | Sanjay Yadav, William Harshbarger, Kam S. Law | 2006-01-03 |
| 6960263 | Shadow frame with cross beam for semiconductor equipment | Sakae Tanaka, Qunhua Wang, Sanjay Yadav, William Harshbarger | 2005-11-01 |
| 6942753 | Gas distribution plate assembly for large area plasma enhanced chemical vapor deposition | Soo Young Choi, Robert I. Greene, Li Hou | 2005-09-13 |
| 6902682 | Method and apparatus for electrostatically maintaining substrate flatness | Robert Robertson, Kam S. Law, James T. Gardner | 2005-06-07 |
| 6896929 | Susceptor shaft vacuum pumping | Sanjay Yadav, Ernst Keller, Wei-Line Chang | 2005-05-24 |
| 6887776 | Methods to form metal lines using selective electrochemical deposition | John M. White, Robert Z. Bachrach, Kam S. Law | 2005-05-03 |
| 6880561 | Fluorine process for cleaning semiconductor process chamber | Haruhiro Harry Goto, William Harshbarger, Kam S. Law | 2005-04-19 |
| 6869838 | Deposition of passivation layers for active matrix liquid crystal display (AMLCD) applications | Kam S. Law, William Harshbarger, Dan Maydan | 2005-03-22 |
| 6863077 | Method and apparatus for enhanced chamber cleaning | Sheng Sun, William Harshbarger, Robert I. Greene | 2005-03-08 |
| 6857387 | Multiple frequency plasma chamber with grounding capacitor at cathode | Sheng Sun, Jeff Olsen, Sanjay Yadav, Kam S. Law | 2005-02-22 |
| 6858548 | Application of carbon doped silicon oxide film to flat panel industry | Tae Kyung Won, William Harshbarger | 2005-02-22 |
| 6843258 | On-site cleaning gas generation for process chamber cleaning | Sanjay Yadav, William Harshbarger, Kam S. Law | 2005-01-18 |
| 6825134 | Deposition of film layers by alternately pulsing a precursor and high frequency power in a continuous gas flow | Kam S. Law, William Harshbarger, Dan Maydan, Soo Young Choi, Beom Soo Park +2 more | 2004-11-30 |
| 6772827 | Suspended gas distribution manifold for plasma chamber | Ernst Keller | 2004-08-10 |
| 6765178 | Chamber for uniform substrate heating | Janine Kardokus, Akihiro Hosokawa | 2004-07-20 |
| 6676761 | Method and apparatus for dechucking a substrate | William Harshbarger, Robert L. Greene, Ichiro Shimizu | 2004-01-13 |
| 6647993 | Surface-treated shower head for use in a substrate processing chamber | Sheng Sun, Kam S. Law, Emanuel Beer | 2003-11-18 |
| 6610354 | Plasma display panel with a low k dielectric layer | Kam S. Law, Takako Takehara, Taekyung Won, William Harshbarger, Dan Maydan | 2003-08-26 |
| 6500265 | Apparatus for electrostatically maintaining subtrate flatness | Robert Robertson, Kam S. Law, James T. Gardner | 2002-12-31 |
| 6468601 | Apparatus and method for white powder reduction in silicon nitride deposition using remote plasma source cleaning technology | Robert Robertson, Kam S. Law, Dan Maydan | 2002-10-22 |
| 6432255 | Method and apparatus for enhancing chamber cleaning | Sheng Sun, William Harshbarger, Robert I. Greene | 2002-08-13 |
| 6355108 | Film deposition using a finger type shadow frame | Tae Kyung Won, Robert Robertson, Soo Young Choi, Kam S. Law, Robert I. Greene +1 more | 2002-03-12 |
| 6182603 | Surface-treated shower head for use in a substrate processing chamber | Sheng Sun, Kam S. Law, Emanuel Beer | 2001-02-06 |