Issued Patents All Time
Showing 76–100 of 105 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 11028478 | Atomic layer deposition of films comprising silicon, carbon and nitrogen using halogenated silicon precursors | Victor Nguyen, Ning Li, Mihaela Balseanu, Li-Qun Xia, David Thompson | 2021-06-08 |
| 10985009 | Methods to deposit flowable (gap-fill) carbon containing films using various plasma sources | Lakmal C. Kalutarage, David Thompson, William J. Durand, Kelvin Chan, Hanhong Chen +1 more | 2021-04-20 |
| 10985014 | Methods for selective deposition on silicon-based dielectrics | Bhaskar Jyoti Bhuyan | 2021-04-20 |
| 10957532 | Method and apparatus for deposition of low-k films | Ning Li, Zhelin Sun, Mihaela Balseanu, Li-Qun Xia, Bhaskar Jyoti Bhuyan | 2021-03-23 |
| 10943780 | Methods for ALD of metal oxides on metal surfaces | Bhaskar Jyoti Bhuyan, David Thompson, Li-Qun Xia | 2021-03-09 |
| 10892157 | Methods for depositing blocking layers on conductive surfaces | Bhaskar Jyoti Bhuyan, Wenyi Liu | 2021-01-12 |
| 10804094 | Methods of depositing SiCON with C, O and N compositional control | David Thompson, Thomas Knisley, Bhaskar Jyoti Bhuyan | 2020-10-13 |
| 10760159 | Methods and apparatus for depositing yttrium-containing films | Lakmal C. Kalutarage, Thomas Knisley, Benjamin Schmiege, David Thompson | 2020-09-01 |
| 10699897 | Acetylide-based silicon precursors and their use as ALD/CVD precursors | Bhaskar Jyoti Bhuyan, Jeffrey W. Anthis, Feng Q. Liu, David Thompson | 2020-06-30 |
| 10633740 | Methods for depositing coatings on aerospace components | Yuriy Melnik, Sukti Chatterjee, Kaushal Gangakhedkar, Jonathan Frankel, Lance A. Scudder +4 more | 2020-04-28 |
| 10453678 | Method and apparatus for deposition of low-k films | Ning Li, Zhelin Sun, Mihaela Balseanu, Li-Qun Xia, Bhaskar Jyoti Bhuyan | 2019-10-22 |
| 10354861 | Low temperature molecular layer deposition of SiCON | David Thompson, Lakmal C. Kalutarage | 2019-07-16 |
| 10219373 | Selective deposition of thin film dielectrics using surface blocking chemistry | David Thompson, Bhaskar Jyoti Bhuyan | 2019-02-26 |
| 10170298 | High temperature silicon oxide atomic layer deposition technology | Wenbo Yan, Cong Trinh, Ning Li, Victor Nguyen, Mihaela Balseanu +1 more | 2019-01-01 |
| 10147599 | Methods for depositing low K and low wet etch rate dielectric thin films | Ning Li, David Thompson, Mihaela Balseanu, Li-Qun Xia | 2018-12-04 |
| 10096464 | Atomic layer deposition of high density silicon dioxide | — | 2018-10-09 |
| 10023958 | Atomic layer deposition of films comprising silicon, carbon and nitrogen using halogenated silicon precursors | Victor Nguyen, Ning Li, Mihaela Balseanu, Li-Qun Xia, David Thompson | 2018-07-17 |
| 9957165 | Precursors suitable for high temperature atomic layer deposition of silicon-containing films | — | 2018-05-01 |
| 9911591 | Selective deposition of thin film dielectrics using surface blocking chemistry | David Thompson, Bhaskar Jyoti Bhuyan | 2018-03-06 |
| 9875888 | High temperature silicon oxide atomic layer deposition technology | Wenbo Yan, Cong Trinh, Ning Li, Victor Nguyen, Mihaela Balseanu +1 more | 2018-01-23 |
| 9812318 | Low temperature molecular layer deposition of SiCON | David Thompson, Lakmal C. Kalutarage | 2017-11-07 |
| 9802828 | Precursors suitable for high temperature atomic layer deposition of silicon-containing films | — | 2017-10-31 |
| 9799511 | Methods for depositing low k and low wet etch rate dielectric thin films | Ning Li, David Thompson, Mihaela Balseanu, Li-Qun Xia | 2017-10-24 |
| 9685325 | Carbon and/or nitrogen incorporation in silicon based films using silicon precursors with organic co-reactants by PE-ALD | David Thompson, Jessica S. Kachian | 2017-06-20 |
| 9520284 | Ion beam activated directional deposition | Tsung-Liang Chen | 2016-12-13 |