Issued Patents All Time
Showing 26–44 of 44 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 6361705 | Plasma process for selectively etching oxide using fluoropropane or fluoropropylene | Ruiping Wang, Gerald Yin, Hao Lu, Robert Wu | 2002-03-26 |
| 6329292 | Integrated self aligned contact etch | Raymond Hung, Joseph P. Caulfield | 2001-12-11 |
| 6284149 | High-density plasma etching of carbon-based low-k materials in a integrated circuit | Zongyu LI, Karsten Schneider, Axel Walter | 2001-09-04 |
| 6238588 | High pressure high non-reactive diluent gas content high plasma ion density plasma oxide etch process | Kenneth S. Collins, David W. Groechel, Raymond Hung, Michael R. Rice, Gerald Yin +1 more | 2001-05-29 |
| 6211092 | Counterbore dielectric plasma etch process particularly useful for dual damascene | Betty Tang | 2001-04-03 |
| 6183655 | Tunable process for selectively etching oxide using fluoropropylene and a hydrofluorocarbon | Ruiping Wang, Gerald Yin, Robert Wu | 2001-02-06 |
| 6168726 | Etching an oxidized organo-silane film | Zongyu LI, Mehul Naik | 2001-01-02 |
| 6126836 | Centrifugal flotation cell with rotating feed | Wan-Tai Yen, Alan R. Pindred | 2000-10-03 |
| 6074959 | Method manifesting a wide process window and using hexafluoropropane or other hydrofluoropropanes to selectively etch oxide | Ruiping Wang, Gerald Yin, Robert Wu | 2000-06-13 |
| 6059118 | Process for recovering fine particulates in a centrifugal flotation cell with rotating drum | Wan-Tai Yen, Alan R. Pindred | 2000-05-09 |
| 5965035 | Self aligned contact etch using difluoromethane and trifluoromethane | Raymond Hung, Joseph P. Caulfield, Gerald Yin | 1999-10-12 |
| 5928125 | Centrifugal flotation cell with rotating drum | Wan-Tai Yen, Alan R. Pindred | 1999-07-27 |
| 5914034 | Centrifugal flotation cell with rotating feed | Wan-Tai Yen, Alan R. Pindred | 1999-06-22 |
| 5624489 | Conversion-preventing additive for high alumina cement products | Yan Fu, James J. Beaudoin | 1997-04-29 |
| 5583737 | Electrostatic chuck usable in high density plasma | Kenneth S. Collins, John Trow, Joshua Chiu-Wing Tsui, Craig A. Roderick, Nicolas Bright +2 more | 1996-12-10 |
| 5560780 | Protective coating for dielectric material on wafer support used in integrated circuit processing apparatus and method of forming same | Robert Wu | 1996-10-01 |
| 5539609 | Electrostatic chuck usable in high density plasma | Kenneth S. Collins, John Trow, Joshua Chiu-Wing Tsui, Craig A. Roderick, Nicolas Bright +2 more | 1996-07-23 |
| 5494513 | Zeolite-based lightweight concrete products | Yan Fu, James J. Beaudoin | 1996-02-27 |
| 5491603 | Method of determining a dechucking voltage which nullifies a residual electrostatic force between an electrostatic chuck and a wafer | Manoocher Birang, Hyman J. Levinstein | 1996-02-13 |