Issued Patents All Time
Showing 51–75 of 107 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 8874250 | Spectrographic monitoring of a substrate during processing using index values | Dominic J. Benvegnu, Harry Q. Lee, Boguslaw A. Swedek, Lakshmanan Karuppiah | 2014-10-28 |
| 8834229 | Dynamically tracking spectrum features for endpoint detection | Harry Q. Lee | 2014-09-16 |
| 8814631 | Tracking spectrum features in two dimensions for endpoint detection | Xiaoyuan Hu, Zhize Zhu, Harry Q. Lee | 2014-08-26 |
| 8815109 | Spectra based endpointing for chemical mechanical polishing | Boguslaw A. Swedek, Dominic J. Benvegnu | 2014-08-26 |
| 8808059 | Spectraphic monitoring based on pre-screening of theoretical library | — | 2014-08-19 |
| 8755928 | Automatic selection of reference spectra library | Jimin Zhang, Harry Q. Lee, Zhihong Wang, Boguslaw A. Swedek, Dominic J. Benvegnu | 2014-06-17 |
| 8755927 | Feedback for polishing rate correction in chemical mechanical polishing | Jun Qian, Charles C. Garretson, Sivakumar Dhandapani, Harry Q. Lee | 2014-06-17 |
| 8751033 | Adaptive tracking spectrum features for endpoint detection | Dominic J. Benvegnu, Boguslaw A. Swedek, Harry Q. Lee | 2014-06-10 |
| 8747189 | Method of controlling polishing | — | 2014-06-10 |
| 8718810 | Semi-quantitative thickness determination | Dominic J. Benvegnu, Boguslaw A. Swedek, Harry Q. Lee | 2014-05-06 |
| 8679979 | Using optical metrology for within wafer feed forward process control | Harry Q. Lee, Boguslaw A. Swedek, Dominic J. Benvegnu, Zhize Zhu, Wen-Chiang Tu | 2014-03-25 |
| 8666665 | Automatic initiation of reference spectra library generation for optical monitoring | Harry Q. Lee, Jun Qian, Jimin Zhang | 2014-03-04 |
| 8579675 | Methods of using optical metrology for feed back and feed forward process control | Harry Q. Lee, Boguslaw A. Swedek, Dominic J. Benvegnu, Zhize Zhu, Wen-Chiang Tu | 2013-11-12 |
| 8569174 | Using spectra to determine polishing endpoints | Harry Q. Lee, Boguslaw A. Swedek, Dominic J. Benvegnu | 2013-10-29 |
| 8554351 | Spectrographic monitoring of a substrate during processing using index values | Dominic J. Benvegnu, Harry Q. Lee, Boguslaw A. Swedek, Lakshmanan Karuppiah | 2013-10-08 |
| 8547538 | Construction of reference spectra with variations in environmental effects | — | 2013-10-01 |
| 8535115 | Gathering spectra from multiple optical heads | Boguslaw A. Swedek, Dominic J. Benvegnu, Sivakumar Dhandapani | 2013-09-17 |
| 8518827 | Spectrum based endpointing for chemical mechanical polishing | Dominic J. Benvegnu, Boguslaw A. Swedek | 2013-08-27 |
| 8467896 | Feedback for polishing rate correction in chemical mechanical polishing | Jun Qian, Charles C. Garretson, Sivakumar Dhandapani, Harry Q. Lee | 2013-06-18 |
| 8392012 | Multiple libraries for spectrographic monitoring of zones of a substrate during processing | Boguslaw A. Swedek, Harry Q. Lee | 2013-03-05 |
| 8369978 | Adjusting polishing rates by using spectrographic monitoring of a substrate during processing | Dominic J. Benvegnu, Harry Q. Lee, Boguslaw A. Swedek | 2013-02-05 |
| 8352061 | Semi-quantitative thickness determination | Dominic J. Benvegnu, Boguslaw A. Swedek, Harry Q. Lee | 2013-01-08 |
| 8292693 | Using optical metrology for wafer to wafer feed back process control | Harry Q. Lee, Boguslaw A. Swedek, Dominic J. Benvegnu, Zhize Zhu, Wen-Chiang Tu | 2012-10-23 |
| 8260446 | Spectrographic monitoring of a substrate during processing using index values | Dominic J. Benvegnu, Harry Q. Lee, Boguslaw A. Swedek, Lakshmanan Karuppiah | 2012-09-04 |
| 8202738 | Endpoint method using peak location of modified spectra | Garrett H. Sin, Harry Q. Lee, Dominic J. Benvegnu | 2012-06-19 |