Issued Patents All Time
Showing 26–50 of 259 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 7262422 | Use of supercritical fluid to dry wafer and clean lens in immersion lithography | Ramkumar Subramanian, Khoi A. Phan | 2007-08-28 |
| 7251033 | In-situ reticle contamination detection system at exposure wavelength | Khoi A. Phan, Bharath Rangarajan, Ramkumar Subramanian | 2007-07-31 |
| 7235474 | System and method for imprint lithography to facilitate dual damascene integration with two imprint acts | Srikanteswara Dakshina-Murthy, Ramkumar Subramanian | 2007-06-26 |
| 7235414 | Using scatterometry to verify contact hole opening during tapered bilayer etch | Ramkumar Subramanian, Calvin T. Gabriel | 2007-06-26 |
| 7224456 | In-situ defect monitor and control system for immersion medium in immersion lithography | Khoi A. Phan, Bharath Rangarajan, Ramkumar Subramanian | 2007-05-29 |
| 7221060 | Composite alignment mark scheme for multi-layers in lithography | Khoi A. Phan, Bharath Rangarajan, Iraj Emami, Ramkumar Subramanian | 2007-05-22 |
| 7187796 | Systems and methods that employ exposure compensation to provide uniform CD control on reticle during fabrication | Khoi A. Phan, Ramkumar Subramanian | 2007-03-06 |
| 7173648 | System and method for visually monitoring a semiconductor processing system | Khoi A. Phan, Bharath Rangarajan, Bryan K. Choo | 2007-02-06 |
| 7159205 | Use of non-lithographic shrink techniques for fabrication/making of imprints masks | Gilles Amblard, Khoi A. Phan | 2007-01-02 |
| 7158896 | Real time immersion medium control using scatterometry | Srikanteswara Dakshina-Murthy, Khoi A. Phan, Ramkumar Subramanian, Bharath Rangarajan, Iraj Emami | 2007-01-02 |
| 7156925 | Using supercritical fluids to clean lenses and monitor defects | Ramkumar Subramanian, Khoi A. Phan, Srikanteswara Dakshina-Murthy | 2007-01-02 |
| 7148142 | System and method for imprint lithography to facilitate dual damascene integration in a single imprint act | Srikanteswara Dakshina-Murthy, Khoi A. Phan | 2006-12-12 |
| 7109046 | Surface oxide tabulation and photo process control and cost savings | Ramkumar Subramanian, Khoi A. Phan | 2006-09-19 |
| 7108946 | Method of lithographic image alignment for use with a dual mask exposure technique | Todd P. Lukanc, Sarah N. McGowan, Joerg Reiss | 2006-09-19 |
| 7100826 | Barcode marking of wafer products for inventory control | Khoi A. Phan, Michael K. Templeton | 2006-09-05 |
| 7084988 | System and method for creation of semiconductor multi-sloped features | Bharath Rangarajan, Ramkumar Subramanian | 2006-08-01 |
| 7078348 | Dual layer patterning scheme to make dual damascene | Ramkumar Subramanian, Bharath Rangarajan, Michael K. Templeton | 2006-07-18 |
| 7080330 | Concurrent measurement of critical dimension and overlay in semiconductor manufacturing | Bryan K. Choo, Bharath Rangarajan, Carmen Morales | 2006-07-18 |
| 7079975 | Scatterometry and acoustic based active control of thin film deposition process | Arvind Halliyal, Ramkumar Subramanian | 2006-07-18 |
| 7076320 | Scatterometry monitor in cluster process tool environment for advanced process control (APC) | Khoi A. Phan, Ramkumar Subramanian | 2006-07-11 |
| 7069155 | Real time analytical monitor for soft defects on reticle during reticle inspection | Khoi A. Phan, Bharath Rangarajan | 2006-06-27 |
| 7065737 | Multi-layer overlay measurement and correction technique for IC manufacturing | Khoi A. Phan, Bharath Rangarajan | 2006-06-20 |
| 7065427 | Optical monitoring and control of two layers of liquid immersion media | Srikanteswara Dakshina-Murthy, Ramkumar Subramanian, Bharath Rangarajan, Khoi A. Phan | 2006-06-20 |
| 7064846 | Non-lithographic shrink techniques for improving line edge roughness and using imperfect (but simpler) BARCs | Gilles Amblard, Khoi A. Phan, Ramkumar Subramanian | 2006-06-20 |
| 7056646 | Use of base developers as immersion lithography fluid | Gilles Amblard, Khoi A. Phan | 2006-06-06 |