Issued Patents 2024
Showing 1–25 of 29 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 12181797 | Extreme ultraviolet mask with alloy based absorbers | Pei-Cheng Hsu, Ping-Hsun Lin, Ta-Cheng Lien | 2024-12-31 |
| 12169357 | Method of fabricating and servicing a photomask | Chun-Fu Yang, Pei-Cheng Hsu, Ta-Cheng Lien | 2024-12-17 |
| 12153339 | Network type pellicle membrane and method for forming the same | Pei-Cheng Hsu, Ta-Cheng Lien | 2024-11-26 |
| 12153337 | Extreme ultraviolet mask with tantalum base alloy absorber | Pei-Cheng Hsu, Ta-Cheng Lien | 2024-11-26 |
| 12147154 | EUV photo masks and manufacturing method thereof | Chia-Jen Chen, Pei-Cheng Hsu, Ta-Cheng Lien | 2024-11-19 |
| 12140857 | Method of fast surface particle and scratch detection for EUV mask backside | Chih-Cheng Chen, ShinAn KU, Ting-Hao Hsu | 2024-11-12 |
| 12135499 | Reticle enclosure for lithography systems | Pei-Cheng Hsu, Ta-Cheng Lien | 2024-11-05 |
| 12130548 | Extreme ultraviolet mask with reduced wafer neighboring effect | Wen-Chang Hsueh, Huan-Ling Lee, Chia-Jen Chen | 2024-10-29 |
| 12092952 | Methods for forming extreme ultraviolet mask comprising magnetic material | Kevin TANADY, Pei-Cheng Hsu, Ta-Cheng Lien, Tzu Yi Wang | 2024-09-17 |
| 12085843 | Method of manufacturing EUV photo masks | Pei-Cheng Hsu, Ta-Cheng Lien, Tzu Yi Wang | 2024-09-10 |
| 12085866 | Particle removing assembly and method of cleaning mask for lithography | Chen-Yang Lin, Da-Wei Yu, Li-Hsin Wang, Kuan-Wen Lin, Chia-Jen Chen | 2024-09-10 |
| 12050399 | Pellicle assembly and method of making same | Pei-Cheng Hsu, Ta-Cheng Lien, Li-Jui Chen, Tsai-Sheng Gau, Chin-Hsiang Lin | 2024-07-30 |
| 12044960 | EUV photo masks and manufacturing method thereof | Pei-Cheng Hsu, Ching-Huang Chen, Hung-Yi Tsai, Ming-Wei Chen, Ta-Cheng Lien | 2024-07-23 |
| 12044959 | EUV photo masks and manufacturing method thereof | Hung-Yi Tsai, Wei-Che Hsieh, Ta-Cheng Lien, Ping-Hsun Lin, Hao-Ping Cheng +2 more | 2024-07-23 |
| 12038693 | Method of manufacturing photo masks | Chien-Cheng Chen, Chia-Jen Chen, Shih-Ming Chang, Tran-Hui Shen, Yen-Cheng HO +1 more | 2024-07-16 |
| 12032302 | Method and device for cleaning substrates | Chung-Hsuan Liu, Chen-Yang Lin, Ku-Hsiang Sung, Da-Wei Yu, Kuan-Wen Lin +1 more | 2024-07-09 |
| 12019367 | Mask blanks and methods for depositing layers on mask blank | Pei-Cheng Hsu, Ta-Cheng Lien, Wen-Chang Hsueh | 2024-06-25 |
| 12013646 | High throughput and high position accurate method for particle inspection of mask pods | Shih-Jui Huang, ShinAn KU, Ting-Hao Hsu | 2024-06-18 |
| 12013632 | Pellicle having vent hole | Chue-San Yoo, Chih-Chiang Tu, Chien-Cheng Chen, Jong-Yuh Chang, Kun-Lung Hsieh +2 more | 2024-06-18 |
| 12013630 | EUV photo masks and manufacturing method thereof | Pei-Cheng Hsu, Ta-Cheng Lien | 2024-06-18 |
| 12001132 | Protection layer on low thermal expansion material (LTEM) substrate of extreme ultraviolet (EUV) mask | Pei-Cheng Hsu, Ta-Cheng Lien, Ping-Hsun Lin, Shih-Che Wang | 2024-06-04 |
| 11988953 | EUV masks to prevent carbon contamination | Pei-Cheng Hsu, Ta-Cheng Lien | 2024-05-21 |
| 11982936 | Photomask and method of fabricating a photomask | Ping-Hsun Lin, Yen-Cheng HO, Chih-Cheng Lin, Chia-Jen Chen | 2024-05-14 |
| 11960201 | Method of critical dimension control by oxygen and nitrogen plasma treatment in EUV mask | Pei-Cheng Hsu, Chun-Fu Yang, Ta-Cheng Lien | 2024-04-16 |
| 11914286 | Pellicle assembly and method for advanced lithography | Amo Chen, Yun-Yue Lin, Ta-Cheng Lien, Chih-Cheng Lin, Jeng-Horng Chen | 2024-02-27 |