Issued Patents 2024
Showing 1–11 of 11 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 12125850 | Buried metal track and methods forming same | Pochun Wang, Ting-Wei Chiang, Chih-Ming Lai, Hui-Zhong Zhuang, Jung-Chan Yang +6 more | 2024-10-22 |
| 12094691 | Etch apparatus for compensating shifted overlayers | Chun-Yen Chang, Yu-Tien Shen, Chih-Kai Yang, Ya Hui Chang | 2024-09-17 |
| 12085867 | Lithography process monitoring method | Chih-Jie Lee, Shih-Chun Huang, Ken-Hsien Hsieh, Yung-Sung Yen, Ru-Gun Liu | 2024-09-10 |
| 12062543 | Line-end extension method and device | Chih-Min HSIAO, Chien-Wen Lai, Ru-Gun Liu, Chih-Ming Lai, Yung-Sung Yen +1 more | 2024-08-13 |
| 12038693 | Method of manufacturing photo masks | Chien-Cheng Chen, Chia-Jen Chen, Hsin-Chang Lee, Tran-Hui Shen, Yen-Cheng HO +1 more | 2024-07-16 |
| 12020984 | Methods for forming self-aligned interconnect structures | Ru-Gun Liu, Hoi-Tou Ng | 2024-06-25 |
| 12019974 | Geometric mask rule check with favorable and unfavorable zones | Shinn-Sheng Yu, Jue-Chin Yu, Ping-Chieh Wu | 2024-06-25 |
| 11994805 | Method of operating semiconductor apparatus | Chiu-Hsiang Chen, Ru-Gun Liu | 2024-05-28 |
| 11929258 | Via connection to a partially filled trench | Chih-Ming Lai, Ru-Gun Liu, Tsai-Sheng Gau, Chung-Ju Lee, Tien-I Bao +1 more | 2024-03-12 |
| 11899367 | Dummy insertion for improving throughput of electron beam lithography | Wen Lo, Chun-Hung Liu, Chia-Hua Chang, Hsin-Wei Wu, Ta-Wei Ou +2 more | 2024-02-13 |
| 11899373 | Proximity effect correction in electron beam lithography | Wen Lo | 2024-02-13 |