Issued Patents 2024
Showing 1–20 of 20 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 12181797 | Extreme ultraviolet mask with alloy based absorbers | Pei-Cheng Hsu, Ping-Hsun Lin, Hsin-Chang Lee | 2024-12-31 |
| 12169357 | Method of fabricating and servicing a photomask | Chun-Fu Yang, Pei-Cheng Hsu, Hsin-Chang Lee | 2024-12-17 |
| 12153351 | Enhancing lithography operation for manufacturing semiconductor devices | Yi-Chen Su, Tzu Yi Wang | 2024-11-26 |
| 12153339 | Network type pellicle membrane and method for forming the same | Pei-Cheng Hsu, Hsin-Chang Lee | 2024-11-26 |
| 12153337 | Extreme ultraviolet mask with tantalum base alloy absorber | Pei-Cheng Hsu, Hsin-Chang Lee | 2024-11-26 |
| 12147154 | EUV photo masks and manufacturing method thereof | Hsin-Chang Lee, Chia-Jen Chen, Pei-Cheng Hsu | 2024-11-19 |
| 12135499 | Reticle enclosure for lithography systems | Pei-Cheng Hsu, Hsin-Chang Lee | 2024-11-05 |
| 12092952 | Methods for forming extreme ultraviolet mask comprising magnetic material | Kevin TANADY, Pei-Cheng Hsu, Tzu Yi Wang, Hsin-Chang Lee | 2024-09-17 |
| 12085843 | Method of manufacturing EUV photo masks | Hsin-Chang Lee, Pei-Cheng Hsu, Tzu Yi Wang | 2024-09-10 |
| 12050399 | Pellicle assembly and method of making same | Hsin-Chang Lee, Pei-Cheng Hsu, Li-Jui Chen, Tsai-Sheng Gau, Chin-Hsiang Lin | 2024-07-30 |
| 12044960 | EUV photo masks and manufacturing method thereof | Pei-Cheng Hsu, Ching-Huang Chen, Hung-Yi Tsai, Ming-Wei Chen, Hsin-Chang Lee | 2024-07-23 |
| 12044959 | EUV photo masks and manufacturing method thereof | Hung-Yi Tsai, Wei-Che Hsieh, Hsin-Chang Lee, Ping-Hsun Lin, Hao-Ping Cheng +2 more | 2024-07-23 |
| 12019367 | Mask blanks and methods for depositing layers on mask blank | Hsin-Chang Lee, Pei-Cheng Hsu, Wen-Chang Hsueh | 2024-06-25 |
| 12013630 | EUV photo masks and manufacturing method thereof | Pei-Cheng Hsu, Hsin-Chang Lee | 2024-06-18 |
| 12001132 | Protection layer on low thermal expansion material (LTEM) substrate of extreme ultraviolet (EUV) mask | Pei-Cheng Hsu, Ping-Hsun Lin, Shih-Che Wang, Hsin-Chang Lee | 2024-06-04 |
| 11988953 | EUV masks to prevent carbon contamination | Pei-Cheng Hsu, Hsin-Chang Lee | 2024-05-21 |
| 11960201 | Method of critical dimension control by oxygen and nitrogen plasma treatment in EUV mask | Pei-Cheng Hsu, Chun-Fu Yang, Hsin-Chang Lee | 2024-04-16 |
| 11914286 | Pellicle assembly and method for advanced lithography | Amo Chen, Yun-Yue Lin, Hsin-Chang Lee, Chih-Cheng Lin, Jeng-Horng Chen | 2024-02-27 |
| 11906897 | Method for extreme ultraviolet lithography mask treatment | Pei-Cheng Hsu, Yih-Chen Su, Chi-Kuang Tsai, Tzu Yi Wang, Jong-Yuh Chang +1 more | 2024-02-20 |
| 11899357 | Lithography mask | Chien-Cheng Chen, Huan-Ling Lee, Chia-Jen Chen, Hsin-Chang Lee | 2024-02-13 |