Issued Patents 2023
Showing 1–20 of 20 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 11852969 | Cleaning method for photo masks and apparatus therefor | Pei-Cheng Hsu, Hao-Ping Cheng, Ta-Cheng Lien | 2023-12-26 |
| 11852966 | Lithography mask with a black border regions and method of fabricating the same | Chin-Hsiang Lin, Chien-Cheng Chen, Chia-Jen Chen, Pei-Cheng Hsu, Yih-Chen Su +2 more | 2023-12-26 |
| 11852965 | Extreme ultraviolet mask with tantalum base alloy absorber | Pei-Cheng Hsu, Ta-Cheng Lien | 2023-12-26 |
| 11846881 | EUV photomask | Ching-Huang Chen, Chi-Yuan Sun, Hua-Tai Lin, Ming-Wei Chen | 2023-12-19 |
| 11829062 | EUV photo masks and manufacturing method thereof | Pei-Cheng Hsu, Ta-Cheng Lien | 2023-11-28 |
| 11822230 | EUV pellicle and mounting method thereof on photo mask | Wen-Yao Wei, Chi-Lun Lu | 2023-11-21 |
| 11815804 | EUV mask blank and method of making EUV mask blank | Ping-Hsun Lin, Pei-Cheng Hsu, Ching-Fang Yu, Ta-Cheng Lien, Chia-Jen Chen | 2023-11-14 |
| 11815805 | Mask for extreme ultraviolet photolithography | Wen-Chang Hsueh, Ta-Cheng Lien | 2023-11-14 |
| 11789356 | Method of manufacturing EUV photo masks | Pei-Cheng Hsu, Ta-Cheng Lien, Tzu Yi Wang | 2023-10-17 |
| 11768431 | Method of fast surface particle and scratch detection for EUV mask backside | Chih-Cheng Chen, ShinAn KU, Ting-Hao Hsu | 2023-09-26 |
| 11740547 | Method of manufacturing extreme ultraviolet mask with reduced wafer neighboring effect | Wen-Chang Hsueh, Huan-Ling Lee, Chia-Jen Chen | 2023-08-29 |
| 11726399 | EUV photo masks and manufacturing method thereof | Pei-Cheng Hsu, Ching-Huang Chen, Hung-Yi Tsai, Ming-Wei Chen, Ta-Cheng Lien | 2023-08-15 |
| 11714350 | Method of fabricating and servicing a photomask | Chun-Fu Yang, Pei-Cheng Hsu, Ta-Cheng Lien | 2023-08-01 |
| 11698592 | Particle removing assembly and method of cleaning mask for lithography | Chen-Yang Lin, Da-Wei Yu, Li-Hsin Wang, Kuan-Wen Lin, Chia-Jen Chen | 2023-07-11 |
| 11687006 | Method of manufacturing photo masks | Chien-Cheng Chen, Chia-Jen Chen, Shih-Ming Chang, Tran-Hui Shen, Yen-Cheng HO +1 more | 2023-06-27 |
| 11650493 | Method of critical dimension control by oxygen and nitrogen plasma treatment in EUV mask | Pei-Cheng Hsu, Chun-Fu Yang, Ta-Cheng Lien | 2023-05-16 |
| 11619875 | EUV photo masks and manufacturing method thereof | Chia-Jen Chen, Pei-Cheng Hsu, Ta-Cheng Lien | 2023-04-04 |
| 11614691 | High throughput and high position accurate method for particle inspection of mask pods | Shih-Jui Huang, ShinAn KU, Ting-Hao Hsu | 2023-03-28 |
| 11592737 | EUV photo masks and manufacturing method thereof | Hung-Yi Tsai, Wei-Che Hsieh, Ta-Cheng Lien, Ping-Hsun Lin, Hao-Ping Cheng +2 more | 2023-02-28 |
| 11561464 | EUV masks to prevent carbon contamination | Pei-Cheng Hsu, Ta-Cheng Lien | 2023-01-24 |