Issued Patents 2023
Showing 1–11 of 11 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 11854820 | Spacer etching process for integrated circuit design | Ru-Gun Liu, Cheng-Hsiung Tsai, Chung-Ju Lee, Chih-Ming Lai, Chia-Ying Lee +6 more | 2023-12-26 |
| 11854807 | Line-end extension method and device | Chih-Min HSIAO, Chien-Wen Lai, Ru-Gun Liu, Chih-Ming Lai, Yung-Sung Yen +1 more | 2023-12-26 |
| 11848208 | Method for forming semiconductor device structure | Chih-Ming Lai, Wei-Liang Lin, Chin-Yuan Tseng, Ru-Gun Liu | 2023-12-19 |
| 11789370 | Optical proximity correction and photomasks | Dong-Yo Jheng, Ken-Hsien Hsieh, Chih-Jie Lee, Shuo-Yen Chou, Ru-Gun Liu | 2023-10-17 |
| 11782352 | Lithography process monitoring method | Chih-Jie Lee, Shih-Chun Huang, Ken-Hsien Hsieh, Yung-Sung Yen, Ru-Gun Liu | 2023-10-10 |
| 11714951 | Geometric mask rule check with favorable and unfavorable zones | Shinn-Sheng Yu, Jue-Chin Yu, Ping-Chieh Wu | 2023-08-01 |
| 11687006 | Method of manufacturing photo masks | Chien-Cheng Chen, Chia-Jen Chen, Hsin-Chang Lee, Tran-Hui Shen, Yen-Cheng HO +1 more | 2023-06-27 |
| 11586115 | Method of operating semiconductor apparatus | Chiu-Hsiang Chen, Ru-Gun Liu | 2023-02-21 |
| 11572087 | Radar monitoring system for traffic control and method thereof | Yu-Jen Lin, Guo-Hao Syu | 2023-02-07 |
| 11556058 | Proximity effect correction in electron beam lithography | Wen Lo | 2023-01-17 |
| 11543753 | Tunable illuminator for lithography systems | Ken-Hsien Hsieh, Wen Lo, Wei-Shuo Su, Hua-Tai Lin | 2023-01-03 |