SC

Shou-Sung Chang

Applied Materials: 12 patents #19 of 1,729Top 2%
Overall (2023): #5,375 of 537,848Top 1%
12
Patents 2023

Issued Patents 2023

Patent #TitleCo-InventorsDate
11833637 Control of steam generation for chemical mechanical polishing Hari Soundararajan, Calvin Spencer Lee, Jonathan P. Domin, Shuchivrat Datar, Dmitry Sklyar +3 more 2023-12-05
11826872 Temperature and slurry flow rate control in CMP Haosheng Wu, Jianshe Tang, Brian J. Brown, Shih-Haur Shen, Hari Soundararajan 2023-11-28
11819976 Spray system for slurry reduction during chemical mechanical polishing (cmp) Chih Chung Chou, Anand N. Iyer, Ekaterina A. Mikhaylichenko, Christopher Heung-Gyun Lee, Erik S. Rondum +1 more 2023-11-21
11806835 Slurry distribution device for chemical mechanical polishing Yen-Chu Yang, Stephen Jew, Jianshe Tang, Haosheng Wu, Paul D. Butterfield +2 more 2023-11-07
11780046 Polishing system with annular platen or polishing pad Paul D. Butterfield, Thomas H. Osterheld, Jeonghoon Oh, Steven M. Zuniga, Fred C. Redeker 2023-10-10
11752589 Chemical mechanical polishing temperature scanning apparatus for temperature control Hari Soundararajan, Haosheng Wu, Jianshe Tang 2023-09-12
11728185 Steam-assisted single substrate cleaning process and apparatus Jianshe Tang, Wei Lu, Haosheng Wu, Taketo Sekine, Hari Soundararajan +1 more 2023-08-15
11697187 Temperature-based assymetry correction during CMP and nozzle for media dispensing Haosheng Wu, Jianshe Tang, Chih Chung, Hui Chen, Hari Soundararajan +1 more 2023-07-11
11633833 Use of steam for pre-heating of CMP components Haosheng Wu, Jianshe Tang, Hari Soundararajan, Paul D. Butterfield, Hui Chen +2 more 2023-04-25
11628478 Steam cleaning of CMP components Haosheng Wu, Jianshe Tang, Hari Soundararajan, Hui Chen, Chih Chung Chou +2 more 2023-04-18
11597052 Temperature control of chemical mechanical polishing Hari Soundararajan, Haosheng Wu, Jianshe Tang, Jeonghoon Oh, Rajeev Bajaj +1 more 2023-03-07
11577358 Gas entrainment during jetting of fluid for temperature control in chemical mechanical polishing Surajit Kumar, Hui Chen, Chih Chung Chou 2023-02-14