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Polishing system with annular platen or polishing pad |
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| 11731238 |
Monitoring of polishing pad texture in chemical mechanical polishing |
Benjamin Cherian |
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| 11701749 |
Monitoring of vibrations during chemical mechanical polishing |
Boguslaw A. Swedek, Dominic J. Benvegnu, Chih Chung Chou, Nicholas A. Wiswell, Jeonghoon Oh |
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| 11699595 |
Imaging for monitoring thickness in a substrate cleaning system |
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| 11651207 |
Training spectrum generation for machine learning system for spectrographic monitoring |
Benjamin Cherian, Nicholas A. Wiswell, Jun Qian |
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Machine vision as input to a CMP process control algorithm |
Benjamin Cherian, Jun Qian, Nicholas A. Wiswell, Dominic J. Benvegnu, Boguslaw A. Swedek |
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| 11571786 |
Consumable part monitoring in chemical mechanical polisher |
Dominic J. Benvegnu |
2023-02-07 |
