Issued Patents 2023
Showing 1–10 of 10 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 11850699 | Switching control algorithms on detection of exposure of underlying layer during polishing | Kun Xu, Harry Q. Lee, David Maxwell Gage | 2023-12-26 |
| 11791224 | Technique for training neural network for use in in-situ monitoring during polishing and polishing system | Kun Xu, Kiran Shrestha, Doyle E. Bennett, David Maxwell Gage, Jun Qian +1 more | 2023-10-17 |
| 11780047 | Determination of substrate layer thickness with polishing pad wear compensation | Kun Xu, Jun Qian, Kiran Shrestha | 2023-10-10 |
| 11731238 | Monitoring of polishing pad texture in chemical mechanical polishing | Thomas H. Osterheld | 2023-08-22 |
| 11733686 | Machine learning systems for monitoring of semiconductor processing | Graham Yennie | 2023-08-22 |
| 11710228 | Detecting an excursion of a CMP component using time-based sequence of images and machine learning | Sidney P. Huey, Thomas Li | 2023-07-25 |
| 11697187 | Temperature-based assymetry correction during CMP and nozzle for media dispensing | Haosheng Wu, Shou-Sung Chang, Jianshe Tang, Chih Chung, Hui Chen +1 more | 2023-07-11 |
| 11658078 | Using a trained neural network for use in in-situ monitoring during polishing and polishing system | Kun Xu, Kiran Shrestha, Doyle E. Bennett, David Maxwell Gage, Jun Qian +1 more | 2023-05-23 |
| 11651207 | Training spectrum generation for machine learning system for spectrographic monitoring | Nicholas A. Wiswell, Jun Qian, Thomas H. Osterheld | 2023-05-16 |
| 11577356 | Machine vision as input to a CMP process control algorithm | Jun Qian, Nicholas A. Wiswell, Dominic J. Benvegnu, Boguslaw A. Swedek, Thomas H. Osterheld | 2023-02-14 |