Issued Patents 2023
Showing 1–10 of 10 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 11826872 | Temperature and slurry flow rate control in CMP | Haosheng Wu, Brian J. Brown, Shih-Haur Shen, Shou-Sung Chang, Hari Soundararajan | 2023-11-28 |
| 11823916 | Apparatus and method of substrate edge cleaning and substrate carrier head gap cleaning | Wei Lu, Jimin Zhang, Brian J. Brown | 2023-11-21 |
| 11806835 | Slurry distribution device for chemical mechanical polishing | Yen-Chu Yang, Stephen Jew, Haosheng Wu, Shou-Sung Chang, Paul D. Butterfield +2 more | 2023-11-07 |
| 11787008 | Chemical mechanical polishing with applied magnetic field | Xingfeng Wang, Feng Q. Liu, David Maxwell Gage, Stephen Jew | 2023-10-17 |
| 11752589 | Chemical mechanical polishing temperature scanning apparatus for temperature control | Hari Soundararajan, Shou-Sung Chang, Haosheng Wu | 2023-09-12 |
| 11728185 | Steam-assisted single substrate cleaning process and apparatus | Wei Lu, Haosheng Wu, Taketo Sekine, Shou-Sung Chang, Hari Soundararajan +1 more | 2023-08-15 |
| 11697187 | Temperature-based assymetry correction during CMP and nozzle for media dispensing | Haosheng Wu, Shou-Sung Chang, Chih Chung, Hui Chen, Hari Soundararajan +1 more | 2023-07-11 |
| 11633833 | Use of steam for pre-heating of CMP components | Haosheng Wu, Hari Soundararajan, Shou-Sung Chang, Paul D. Butterfield, Hui Chen +2 more | 2023-04-25 |
| 11628478 | Steam cleaning of CMP components | Haosheng Wu, Hari Soundararajan, Shou-Sung Chang, Hui Chen, Chih Chung Chou +2 more | 2023-04-18 |
| 11597052 | Temperature control of chemical mechanical polishing | Hari Soundararajan, Shou-Sung Chang, Haosheng Wu, Jeonghoon Oh, Rajeev Bajaj +1 more | 2023-03-07 |