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Microwave plasma source for spatial plasma enhanced atomic layer deposition (PE-ALD) processing tool |
Jozef Kudela, Tsutomu Tanaka, Alexander V. Garachtchenko, Avinash Shervegar, Kallol Bera +3 more |
2023-11-21 |
| 11776835 |
Power supply signal conditioning for an electrostatic chuck |
Zheng John Ye, Daemian Raj Benjamin Raj, Rana Howlader, Abhigyan Keshri, Sanjay Kamath +6 more |
2023-10-03 |
| 11776793 |
Plasma source with ceramic electrode plate |
Robert B. Moore, Jared Ahmad Lee, Marc Shull, Tsutomu Tanaka, Alexander V. Garachtchenko |
2023-10-03 |
| 11705312 |
Vertically adjustable plasma source |
Tsutomu Tanaka, Jared Ahmad Lee, Rakesh Ramadas, Gregory J. Wilson, Sriharish Srinivasan |
2023-07-18 |
| 11631583 |
RF power source operation in plasma enhanced processes |
Farhad Moghadam, Hari Ponnekanti |
2023-04-18 |
| 11626853 |
RF power delivery architecture with switchable match and frequency tuning |
Edward P. Hammond, IV, Yury Trachuk |
2023-04-11 |
| 11594440 |
Real time bias detection and correction for electrostatic chuck |
Jian Li, Juan Carlos Rocha-Alvarez |
2023-02-28 |
| 11587817 |
High temperature bipolar electrostatic chuck |
Jian Li, Zheng John Ye, Juan Carlos Rocha-Alvarez |
2023-02-21 |
| 11570879 |
Methods and apparatus for controlling RF parameters at multiple frequencies |
Zheng John Ye, Daemian Raj Benjamin Raj, Shailendra Srivastava, Nikhil Sudhindrarao Jorapur, Ndanka O. Mukuti +1 more |
2023-01-31 |
