Issued Patents 2022
Showing 1–6 of 6 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 11537043 | Reduction or elimination of pattern placement error in metrology measurements | Yoel Feler, Roel Gronheid, Sharon Aharon, Evgeni Gurevich, Anna Golotsvan +1 more | 2022-12-27 |
| 11378394 | On-the-fly scatterometry overlay metrology target | Yuri Paskover, Itay Gdor, Yuval Lubashevksy, Alexander Volfman, Yoram Uziel | 2022-07-05 |
| 11372340 | Method and system for providing a quality metric for improved process control | Daniel Kandel, Guy M. Cohen, Dana Klein, Noam Sapiens, Alex Shulman +3 more | 2022-06-28 |
| 11314173 | Topographic phase control for overlay measurement | Yuri Paskover, Amnon Manassen, Yoni Shalibo | 2022-04-26 |
| 11281111 | Off-axis illumination overlay measurement using two-diffracted orders imaging | Yoni Shalibo, Yuri Paskover, Amnon Manassen, Shlomo Eisenbach, Gilad Laredo +1 more | 2022-03-22 |
| 11256177 | Imaging overlay targets using Moiré elements and rotational symmetry arrangements | Yoel Feler, Mark Ghinovker, Diana Shaphirov, Evgeni Gurevich | 2022-02-22 |