Issued Patents 2022
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 11537043 | Reduction or elimination of pattern placement error in metrology measurements | Yoel Feler, Vladimir Levinski, Roel Gronheid, Sharon Aharon, Evgeni Gurevich +1 more | 2022-12-27 |
| 11353493 | Data-driven misregistration parameter configuration and measurement system and method | Shlomit Katz, Roie Volkovich, Raviv Yohanan | 2022-06-07 |
| 11353799 | System and method for error reduction for metrology measurements | Roie Volkovich, Liran Yerushalmi, Rawi Dirawi, Chen Dror, Nir BenDavid +3 more | 2022-06-07 |