Issued Patents 2022
Showing 1–3 of 3 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 11537043 | Reduction or elimination of pattern placement error in metrology measurements | Vladimir Levinski, Roel Gronheid, Sharon Aharon, Evgeni Gurevich, Anna Golotsvan +1 more | 2022-12-27 |
| 11302544 | Method for measuring and correcting misregistration between layers in a semiconductor device, and misregistration targets useful therein | Roie Volkovich, Renan Milo, Liran Yerushalmi, Moran Zaberchik, David Izraeli | 2022-04-12 |
| 11256177 | Imaging overlay targets using Moiré elements and rotational symmetry arrangements | Mark Ghinovker, Diana Shaphirov, Evgeni Gurevich, Vladimir Levinski | 2022-02-22 |