Issued Patents 2022
Showing 1–2 of 2 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 11537043 | Reduction or elimination of pattern placement error in metrology measurements | Yoel Feler, Vladimir Levinski, Sharon Aharon, Evgeni Gurevich, Anna Golotsvan +1 more | 2022-12-27 |
| 11460783 | System and method for focus control in extreme ultraviolet lithography systems using a focus-sensitive metrology target | Xuemei Chen | 2022-10-04 |