Issued Patents 2022
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 11537043 | Reduction or elimination of pattern placement error in metrology measurements | Yoel Feler, Vladimir Levinski, Roel Gronheid, Sharon Aharon, Anna Golotsvan +1 more | 2022-12-27 |
| 11256177 | Imaging overlay targets using Moiré elements and rotational symmetry arrangements | Yoel Feler, Mark Ghinovker, Diana Shaphirov, Vladimir Levinski | 2022-02-22 |