Issued Patents 2022
Showing 1–6 of 6 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 11537043 | Reduction or elimination of pattern placement error in metrology measurements | Yoel Feler, Vladimir Levinski, Roel Gronheid, Sharon Aharon, Evgeni Gurevich +1 more | 2022-12-27 |
| 11532566 | Misregistration target having device-scaled features useful in measuring misregistration of semiconductor devices | Roie Volkovich, Liran Yerushalmi, Raviv Yohanan | 2022-12-20 |
| 11476144 | Single cell in-die metrology targets and measurement methods | — | 2022-10-18 |
| 11467503 | Field-to-field corrections using overlay targets | Enna Leshinsky-Altshuller, Inna Tarshish-Shapir, Diana Shaphirov, Guy Ben Dov, Roie Volkovich +1 more | 2022-10-11 |
| 11355375 | Device-like overlay metrology targets displaying Moiré effects | Roie Volkovich, Liran Yerushalmi, Raviv Yohanan | 2022-06-07 |
| 11256177 | Imaging overlay targets using Moiré elements and rotational symmetry arrangements | Yoel Feler, Diana Shaphirov, Evgeni Gurevich, Vladimir Levinski | 2022-02-22 |