Issued Patents 2020
Showing 1–11 of 11 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 10871367 | Substrate, metrology apparatus and associated methods for a lithographic process | Alok Verma, Hugo Augustinus Joseph Cramer, Thomas Theeuwes, Bert Verstraeten | 2020-12-22 |
| 10811323 | Method and apparatus to determine a patterning process parameter | Adriaan Johan Van Leest, Paul Christiaan Hinnen, Elliott Gerard McNamara, Alok Verma, Thomas Theeuwes +5 more | 2020-10-20 |
| 10795269 | Method of determining a value of a parameter of interest, method of cleaning a signal containing information about a parameter of interest, device manufacturing method | Zili Zhou, Gerbrand Van Der Zouw, Nitesh Pandey, Markus Gerardus Martinus Maria Van Kraaij, Martinus Hubertus Maria Van Weert +2 more | 2020-10-06 |
| 10782617 | Method and apparatus to determine a patterning process parameter | Elliott Gerard McNamara | 2020-09-22 |
| 10747122 | Method of measuring a parameter of a device manufacturing process, metrology apparatus, substrate, target, device manufacturing system, and device manufacturing method | Alok Verma, Bert Verstraeten | 2020-08-18 |
| 10677589 | Substrate, metrology apparatus and associated methods for a lithographic process | Alok Verma, Hugo Augustinus Joseph Cramer, Thomas Theeuwes, Bert Verstraeten | 2020-06-09 |
| 10615084 | Method and apparatus to determine a patterning process parameter, associated with a change in a physical configuration, using measured pixel optical characteristic values | Adriaan Johan Van Leest, Paul Christiaan Hinnen, Elliott Gerard McNamara, Alok Verma, Thomas Theeuwes +1 more | 2020-04-07 |
| 10585354 | Method of optimizing a metrology process | Joannes Jitse Venselaar, Samee Ur Rehman, Mariya Vyacheslavivna Medvedyeva, Bastiaan Onne Fagginger Auer, Martijn Maria Zaal +1 more | 2020-03-10 |
| 10585048 | Method of determining a value of a parameter of interest of a target formed by a patterning process | Samee Ur Rehman, Sergey Tarabrin, Joannes Jitse Venselaar, Alexandru ONOSE, Mariya Vyacheslavivna Medvedyeva | 2020-03-10 |
| 10571363 | Method of determining an optimal focus height for a metrology apparatus | Mariya Vyacheslavivna Medvedyeva, Hugo Augustinus Joseph Cramer, Martinus Hubertus Maria Van Weert, Bastiaan Onne Fagginger Auer, Xiaoxin Shang +2 more | 2020-02-25 |
| 10546790 | Method and apparatus to determine a patterning process parameter | Adriaan Johan Van Leest, Paul Christiaan Hinnen, Elliott Gerard McNamara, Alok Verma, Thomas Theeuwes +1 more | 2020-01-28 |