Issued Patents 2020
Showing 1–9 of 9 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 10871367 | Substrate, metrology apparatus and associated methods for a lithographic process | Alok Verma, Thomas Theeuwes, Anagnostis Tsiatmas, Bert Verstraeten | 2020-12-22 |
| 10845713 | Metrology method and apparatus, computer program and lithographic system | Thomas Theeuwes | 2020-11-24 |
| 10811323 | Method and apparatus to determine a patterning process parameter | Adriaan Johan Van Leest, Anagnostis Tsiatmas, Paul Christiaan Hinnen, Elliott Gerard McNamara, Alok Verma +5 more | 2020-10-20 |
| 10732514 | Metrology method and apparatus with increased bandwidth | Seyed Iman Mossavat, Paul Christiaan Hinnen | 2020-08-04 |
| 10677589 | Substrate, metrology apparatus and associated methods for a lithographic process | Alok Verma, Thomas Theeuwes, Anagnostis Tsiatmas, Bert Verstraeten | 2020-06-09 |
| 10627213 | Statistical hierarchical reconstruction from metrology data | Seyed Iman Mossavat, Remco Dirks | 2020-04-21 |
| 10615084 | Method and apparatus to determine a patterning process parameter, associated with a change in a physical configuration, using measured pixel optical characteristic values | Adriaan Johan Van Leest, Anagnostis Tsiatmas, Paul Christiaan Hinnen, Elliott Gerard McNamara, Alok Verma +1 more | 2020-04-07 |
| 10571363 | Method of determining an optimal focus height for a metrology apparatus | Mariya Vyacheslavivna Medvedyeva, Anagnostis Tsiatmas, Martinus Hubertus Maria Van Weert, Bastiaan Onne Fagginger Auer, Xiaoxin Shang +2 more | 2020-02-25 |
| 10546790 | Method and apparatus to determine a patterning process parameter | Adriaan Johan Van Leest, Anagnostis Tsiatmas, Paul Christiaan Hinnen, Elliott Gerard McNamara, Alok Verma +1 more | 2020-01-28 |