Issued Patents 2020
Showing 1–4 of 4 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 10739687 | Metrology method and apparatus, substrate, lithographic system and device manufacturing method | Hendrik Jan Hidde Smilde, Davit Harutyunyan, Patrick Warnaar | 2020-08-11 |
| 10599047 | Metrology apparatus, lithographic system, and method of measuring a structure | Janneke Ravensbergen, Nitesh Pandey, Zili Zhou, Armand Eugene Albert Koolen, Sebastianus Adrianus GOORDEN +1 more | 2020-03-24 |
| 10585354 | Method of optimizing a metrology process | Anagnostis Tsiatmas, Joannes Jitse Venselaar, Samee Ur Rehman, Mariya Vyacheslavivna Medvedyeva, Martijn Maria Zaal +1 more | 2020-03-10 |
| 10571363 | Method of determining an optimal focus height for a metrology apparatus | Mariya Vyacheslavivna Medvedyeva, Anagnostis Tsiatmas, Hugo Augustinus Joseph Cramer, Martinus Hubertus Maria Van Weert, Xiaoxin Shang +2 more | 2020-02-25 |