Issued Patents 2020
Showing 1–2 of 2 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 10816909 | Metrology system and method for determining a characteristic of one or more structures on a substrate | Patricius Aloysius Jacobus Tinnemans, Arie Jeffrey Den Boef, Armand Eugene Albert Koolen, Nitesh Pandey, Vasco Tomas Tenner +1 more | 2020-10-27 |
| 10739687 | Metrology method and apparatus, substrate, lithographic system and device manufacturing method | Hendrik Jan Hidde Smilde, Bastiaan Onne Fagginger Auer, Davit Harutyunyan | 2020-08-11 |